羟基磷灰石涂层金属：烧结过程中的界面反应。

Hydroxyapatite-coated metals: interfacial reactions during sintering.

作者信息

Wei M, Ruys A J, Swain M V, Milthorpe B K, Sorrell C C

机构信息

Department of Mettallurgy and Materials Engineering, University of Connecticut, CT, 06269, USA.

出版信息

J Mater Sci Mater Med. 2005 Feb;16(2):101-6. doi: 10.1007/s10856-005-5995-6.

DOI:10.1007/s10856-005-5995-6

PMID:15744597

Abstract

Electrophoretic deposition (EPD) is a low cost flexible process for producing HA coatings on metal implants. Its main limitation is that it requires heating the coated implant in order to densify the HA. HA typically sinters at a temperature below 1150 degrees C, but metal implants are degraded above 1000 degrees C. Further, the metal induces the decomposition of the HA coating upon sintering. Recent developments have enabled EPD of metathesis-synthesised uncalcined HA which sinters at approximately 1000 degrees C. The effects of temperature on HA-coated Ti, Ti6Al4V, and 316L stainless steel were investigated for dual coatings of metathesis HA sintered at 1000 degrees C. The use of dual HA coatings (coat, sinter, coat, sinter) enabled decomposition to be confined to the "undercoat" (HA layer 1), with the surface coating decomposition free. The tensile strength of the three metals was not significantly affected by the high sintering temperatures (925 degrees C < T < 1000 degrees C). XRD/SEM/EDS analyses of the interfacial zones revealed that 316L had a negligible HA:metal interfacial zone (approximately 1 microm) while HA:Ti and HA:Ti6Al4V had large interfacial zones (>10 microm) comprising a TiO2 oxidation zone and a CaTiO2 reaction zone.

摘要

电泳沉积（EPD）是一种在金属植入物上制备HA涂层的低成本灵活工艺。其主要局限性在于，为了使HA致密化，需要对涂覆的植入物进行加热。HA通常在低于1150摄氏度的温度下烧结，但金属植入物在高于1000摄氏度时会降解。此外，金属在烧结时会导致HA涂层分解。最近的进展使得能够电泳沉积复分解合成的未煅烧HA，其在大约1000摄氏度下烧结。研究了温度对HA涂层的钛、Ti6Al4V和316L不锈钢的影响，用于在1000摄氏度下烧结的复分解HA双涂层。使用双HA涂层（涂覆、烧结、涂覆、烧结）能够将分解限制在“底涂层”（HA层1），表面涂层无分解。三种金属的拉伸强度在高烧结温度（925摄氏度 < T < 1000摄氏度）下没有受到显著影响。对界面区域的XRD/SEM/EDS分析表明，316L的HA:金属界面区域可忽略不计（约1微米），而HA:钛和HA:Ti6Al4V具有较大的界面区域（>10微米），包括一个TiO2氧化区和一个CaTiO2反应区。