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带有集成电压和电流探头的射频辉光放电源,用于测量绝缘样品的溅射速率和发射产率。

Radio frequency glow discharge source with integrated voltage and current probes used for sputtering rate and emission yield measurements at insulating samples.

作者信息

Wilken L, Hoffmann V, Wetzig K

机构信息

Leibniz Institute for Solid State and Materials Research Dresden, P.O. Box 270116, 01171 Dresden, Germany.

出版信息

Anal Bioanal Chem. 2005 Oct;383(3):424-33. doi: 10.1007/s00216-005-3246-9. Epub 2005 Oct 19.

Abstract

Radio frequency glow discharge optical emission spectroscopy (RF-GD-OES) is routinely used for the chemical analysis of solid samples. Two independent electrical signals from the discharge are required for quantification. When sputtering insulating samples, the voltage over the discharge is not directly measurable. The coupling capacity of the sample is required in order to calculate the discharge voltage. A procedure is outlined where the coupling capacity is determined using an electrical measurement without discharge. The calculated time-dependent discharge voltage and current are evaluated using a plasma equivalent circuit. An insulating sample is sputtered at constant cathode voltage and current. The emission yield for an aluminium line is comparable to that of conducting reference material.

摘要

射频辉光放电光发射光谱法(RF-GD-OES)通常用于固体样品的化学分析。定量分析需要来自放电的两个独立电信号。在溅射绝缘样品时,放电电压无法直接测量。为了计算放电电压,需要样品的耦合电容。本文概述了一种通过无放电的电学测量来确定耦合电容的方法。使用等离子体等效电路评估计算出的随时间变化的放电电压和电流。在恒定的阴极电压和电流下溅射绝缘样品。铝线的发射率与导电参考材料的发射率相当。

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