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通过光波导光模式光谱法测量施加电压下的原位逐层成膜动力学。

In situ layer-by-layer film formation kinetics under an applied voltage measured by optical waveguide lightmode spectroscopy.

作者信息

Ngankam A Pascal, Van Tassel Paul R

机构信息

Department of Chemical Engineering, Yale University, New Haven, Connecticut 06520-8286, USA.

出版信息

Langmuir. 2005 Jun 21;21(13):5865-71. doi: 10.1021/la050066d.

Abstract

Layer-by-layer (LbL) thin film assembly occurs via the alternate adsorption of positively and negatively charged macromolecular species. We investigate here the control of LbL film growth through the electric potential of the underlying substrate. We employ optical waveguide lightmode spectroscopy (OWLS) to obtain in situ kinetic measurements of poly(allylamine hydrochloride)/poly(sodium 4-styrenesulfonate) (PAH/PSS) and poly(L-lysine)/dextran sulfate (PLL/DXS) multilayer film formation in the presence of an applied voltage difference (deltaV) between the adsorbing substrate, an indium tin oxide- (ITO-) coated waveguiding sensor chip, and a parallel platinum counterelectrode. We find initial layer adsorption to be significantly enhanced by an applied potential for both polyelectrolyte systems: the mass and thickness of (positively charged) PAH and PLL layers on ITO are about 60% and 500% larger, respectively, at deltaV = 2 V than at open circuit potential (OCP), in apparent violation of electrostatics. A kinetic analysis reveals the initial attachment rate constant to decrease with voltage, in agreement with electrostatics. To reconcile these results, we propose a more coiled and loosely bound adsorbed polymer conformation at higher applied potential. Following 10 adsorption steps, the mass and thickness of a PAH/PSS film grown under deltaV = 2 V are about 15% less than those of a comparable film grown under OCP, reflecting a lower degree of complexation between adsorbing polyanions and more highly coiled adsorbed polycations. Following 14 adsorption steps, the mass and thickness of a PLL/DXS film grown under deltaV = 2 V are about 70% greater than those of a comparable film grown under OCP, reflecting the increased charge overcompensation in the initial layer. We find the scaling of film mass () with the number of adsorption steps (n) to be linear in the PAH/PSS system and exponential (i.e., approximately eyn) in the PLL/DXS system, irrespective of applied voltage. We observe to decrease with applied voltage and to exhibit a crossover to a smaller value around n = 5. Extrapolation reveals PLL/DXS multilayer films to be suppressed by increased voltage in the limit of large n: the mass of films grown at OCP and deltaV = 1 V would surpass that of a film grown under deltaV = 2 V at about the 23rd and 18th adsorption steps, respectively. The formation kinetics of PLL/DXS, but not PAH/PSS, change qualitatively under voltage: PLL adsorption is slow to reach a plateau, possibly due to the formation of secondary structure, and a decrease in film mass occurs toward the end of each DXS adsorption step, suggesting spontaneous removal of some PLL/DXS complexes from the film.

摘要

逐层(LbL)薄膜组装是通过带正电和带负电的大分子物种交替吸附来实现的。我们在此研究通过底层基板的电势来控制LbL薄膜的生长。我们采用光波导光模式光谱法(OWLS),以原位动力学测量在吸附基板(氧化铟锡(ITO)涂层的波导传感器芯片)与平行铂对电极之间存在施加电压差(ΔV)的情况下,聚(烯丙胺盐酸盐)/聚(4 - 苯乙烯磺酸钠)(PAH/PSS)和聚(L - 赖氨酸)/硫酸葡聚糖(PLL/DXS)多层膜的形成。我们发现,对于这两种聚电解质体系,施加电势均会显著增强初始层的吸附:在ΔV = 2 V时,ITO上(带正电的)PAH层和PLL层的质量和厚度分别比开路电势(OCP)时大约大60%和500%,这明显违反了静电学原理。动力学分析表明,初始附着速率常数随电压降低,这与静电学原理相符。为了调和这些结果,我们提出在较高施加电势下聚合物构象更加卷曲且结合松散。经过10次吸附步骤后,在ΔV = 2 V下生长的PAH/PSS薄膜的质量和厚度比在OCP下生长的可比薄膜小约15%,这反映出吸附的聚阴离子与高度卷曲的吸附聚阳离子之间的络合程度较低。经过14次吸附步骤后,在ΔV = 2 V下生长的PLL/DXS薄膜的质量和厚度比在OCP下生长的可比薄膜大约大70%,这反映出初始层中电荷过度补偿增加。我们发现,无论施加电压如何,在PAH/PSS体系中薄膜质量()与吸附步骤数(n)的关系呈线性,而在PLL/DXS体系中呈指数关系(即近似为ey n)。我们观察到随施加电压降低,并在n = 5左右出现交叉变为较小的值。外推结果表明,在n较大的极限情况下,增加电压会抑制PLL/DXS多层膜的生长:在OCP和ΔV = 1 V下生长的薄膜质量将分别在大约第23次和第18次吸附步骤时超过在ΔV = 2 V下生长的薄膜质量。在电压作用下,PLL/DXS而非PAH/PSS的形成动力学发生了定性变化:PLL吸附缓慢达到平稳状态,可能是由于二级结构的形成,并且在每次DXS吸附步骤接近尾声时薄膜质量会下降,这表明一些PLL/DXS络合物会自发地从薄膜中去除。

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