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氢终止硅纳米线表面的结构与能量学

Structures and energetics of hydrogen-terminated silicon nanowire surfaces.

作者信息

Zhang R Q, Lifshitz Y, Ma D D D, Zhao Y L, Frauenheim Th, Lee S T, Tong S Y

机构信息

Center of Super-Diamond and Advanced Films, Department of Physics and Materials Science, City University of Hong Kong, Hong Kong SAR, China.

出版信息

J Chem Phys. 2005 Oct 8;123(14):144703. doi: 10.1063/1.2047555.

Abstract

The analysis and density-functional tight-binding simulations of possible configurations of silicon nanowires (SiNWs) enclosed by low-index surfaces reveal a number of remarkable features. For wires along <100>, <110>, and <111> directions, many low-index facet configurations and cross sections are possible, making their controlled growth difficult. The 112 wires are the most attractive for research and applications because they have only one configuration of enclosing low-index facets with a rectangular cross section, enclosed with the most stable (111) facet and the (110) facet next to it. In general, the stability of the SiNWs is determined by a balance between (1) minimization of the surface energy gamma(111)<gamma(110)<gamma(001), and (2) minimization of the surface-to-volume ratio [svr; svr(hexagonal)>svr(rectangular)>svr(triangular)]. The energy band gaps follow the order of <100>wires > <112>wires > <111>wires > <110>wires. The results are compared with our recent scanning tunneling microscopy and transmission electron microscopy data.

摘要

对由低指数表面包围的硅纳米线(SiNWs)可能构型的分析和密度泛函紧束缚模拟揭示了许多显著特征。对于沿<100>、<110>和<111>方向的纳米线,存在许多低指数晶面构型和横截面,这使得它们的可控生长变得困难。112纳米线对于研究和应用最具吸引力,因为它们只有一种由矩形横截面的低指数包围晶面构型,由最稳定的(111)晶面和相邻的(110)晶面所包围。一般来说,SiNWs的稳定性由以下两者之间的平衡决定:(1)表面能γ(111)<γ(110)<γ(001)的最小化,以及(2)表面体积比[svr;svr(六边形)>svr(矩形)>svr(三角形)]的最小化。能带隙遵循<100>纳米线><112>纳米线><(111)纳米线><(110)纳米线的顺序。将结果与我们最近的扫描隧道显微镜和透射电子显微镜数据进行了比较。

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