Ma D D D, Lee C S, Au F C K, Tong S Y, Lee S T
Center of Super-Diamond and Advanced Films and Department of Physics and Materials Science, City University of Hong Kong, Hong Kong SAR, China.
Science. 2003 Mar 21;299(5614):1874-7. doi: 10.1126/science.1080313. Epub 2003 Feb 20.
Small-diameter (1 to 7 nanometers) silicon nanowires (SiNWs) were prepared, and their surfaces were removed of oxide and terminated with hydrogen by a hydrofluoric acid dip. Scanning tunneling microscopy (STM) of these SiNWs, performed both in air and in ultrahigh vacuum, revealed atomically resolved images that can be interpreted as hydrogen-terminated Si (111)-(1 x 1) and Si (001)-(1 x 1) surfaces corresponding to SiH3 on Si (111) and SiH2 on Si (001), respectively. These hydrogen-terminated SiNW surfaces seem to be more oxidation-resistant than regular silicon wafer surfaces, because atomically resolved STM images of SiNWs were obtained in air after several days' exposure to the ambient environment. Scanning tunneling spectroscopy measurements were performed on the oxide-removed SiNWs and were used to evaluate the electronic energy gaps. The energy gaps were found to increase with decreasing SiNW diameter from 1.1 electron volts for 7 nanometers to 3.5 electron volts for 1.3 nanometers, in agreement with previous theoretical predictions.
制备了小直径(1至7纳米)的硅纳米线(SiNWs),通过氢氟酸浸渍去除其表面的氧化物并用氢终止。在空气和超高真空中对这些SiNWs进行扫描隧道显微镜(STM)观察,得到了原子分辨图像,可解释为分别对应于Si(111)上的SiH3和Si(001)上的SiH2的氢终止Si(111)-(1×1)和Si(001)-(1×1)表面。这些氢终止的SiNW表面似乎比普通硅片表面更抗氧化,因为在暴露于环境中几天后,在空气中获得了SiNWs的原子分辨STM图像。对去除氧化物的SiNWs进行了扫描隧道光谱测量,并用于评估电子能隙。发现能隙随着SiNW直径的减小而增加,从7纳米时的1.1电子伏特增加到1.3纳米时的3.5电子伏特,这与先前的理论预测一致。