Wang Qingtao, Wang Guanzhong, Han Xinhai, Wang Xiaoping, Hou J G
Hefei National Laboratory for Physical Sciences at Microscale, University of Science and Technology of China, Hefei 230026, China.
J Phys Chem B. 2005 Dec 15;109(49):23326-9. doi: 10.1021/jp0530202.
We describe a new synthetic approach to fabricate Ni/Cu nanocable arrays by co-depositing nickel and copper atoms into the pores of anodic alumina membranes and to fabricate Ni nanotube arrays by selectively etching the Cu cores from the Ni/Cu nanocable arrays. The formation of the Ni-shelled Ni/Cu nanocables is attributed to the Ni ions adsorbed on the pore walls by a chemical complexation through hydroxyl groups. By varying electrodepositon parameters in this technique, we can control the lengths of nanocables and nanotubes, the shell thickness of the nanocables, and the wall thickness and surface morphology of the nanotubes.
我们描述了一种新的合成方法，通过将镍和铜原子共沉积到阳极氧化铝膜的孔中来制造镍/铜纳米线阵列，并通过从镍/铜纳米线阵列中选择性蚀刻铜核来制造镍纳米管阵列。镍包覆的镍/铜纳米线的形成归因于镍离子通过羟基通过化学络合吸附在孔壁上。通过改变该技术中的电沉积参数，我们可以控制纳米线和纳米管的长度、纳米线的壳厚度以及纳米管的壁厚和表面形态。
