Ono Takahiro, Ishikawa Kaori, Yamaba Osamu, Nokubi Takashi
Division of Oromaxillofacial Regeneration, Osaka University Graduate School of Dentistry, Suita, Japan.
Dent Mater J. 2005 Dec;24(4):487-93. doi: 10.4012/dmj.24.487.
In a previous report, we investigated the influence of the shooting angle of polishing particle on the surface roughness of a cobalt-chromium (Co-Cr) alloy using a centrifugal shooting type polishing machine. In the present work, we examined the effects of the texture of polishing particle and polishing time on the surface roughness of Co-Cr alloy cast specimens. Nine different textures of polishing particle were investigated with respect to core material and particle abrasiveness: three different elastic body cores (core A, hard chloroprene rubber; core B, soft chloroprene rubber; core C, natural rubber) and three different green carborundum powders as abrasives (#800, #3000, and #6000). Polishing was performed under a fixed shooting angle of 30 degrees for six different polishing times (1, 2, 3, 5, 7, and 10 minutes). Surface roughness (Ra, Sm) and cutting depth on the polished surface were measured after each polishing stage. Surface roughness was significantly improved within three minutes, particularly using a polishing particle with rough carborundum powder (#800 or #3000) and a heavy core (core A or core B). Cutting depth increased in proportion to polishing time and roughness of carborundum powder, and was least with core C. These results suggested that a polishing particle composed of core B and #3000 carborundum paste was superior for the intermediate polishing of a Co-Cr alloy, and that polishing time should be limited to within three minutes.
在之前的一份报告中，我们使用离心喷射式抛光机研究了抛光颗粒的喷射角度对钴铬（Co-Cr）合金表面粗糙度的影响。在本研究中，我们考察了抛光颗粒的质地和抛光时间对Co-Cr合金铸造试样表面粗糙度的影响。针对核心材料和颗粒磨蚀性研究了九种不同质地的抛光颗粒：三种不同的弹性体核心（核心A，硬氯丁橡胶；核心B，软氯丁橡胶；核心C，天然橡胶）以及三种不同的绿碳化硅粉末作为磨料（#800、#3000和#6000）。在30度的固定喷射角度下进行抛光，抛光时间分为六种不同时长（1、2、3、5、7和10分钟）。在每个抛光阶段后测量抛光表面的表面粗糙度（Ra、Sm）和切削深度。在三分钟内表面粗糙度得到显著改善，尤其是使用带有粗糙碳化硅粉末（#800或#3000）和重核心（核心A或核心B）的抛光颗粒时。切削深度与抛光时间和碳化硅粉末的粗糙度成正比，并且使用核心C时切削深度最小。这些结果表明，由核心B和#3000碳化硅膏组成的抛光颗粒对于Co-Cr合金的中间抛光效果更佳，并且抛光时间应限制在三分钟以内。
