Hampton Jennifer R, Dameron Arrelaine A, Weiss Paul S
Departments of Chemistry and Physics, The Pennsylvania State University, University Park, Pennsylvania 16802-6300, USA.
J Am Chem Soc. 2006 Feb 8;128(5):1648-53. doi: 10.1021/ja056369b.
We have investigated the transport mechanism of the inks most typically used in dip-pen nanolithography by patterning both 16-mercaptohexadecanoic acid (MHDA) and 1-octadecanethiol (ODT) on the same Au{111} substrate. Several pattern geometries were used to probe ink transport from the tip to the sample during patterning of both dots (stationary tip) and lines (moving tip). When ODT was written on top of a pre-existing MHDA structure, the ODT was observed at the outsides of the MHDA structure, and the transport rate increased. In the reverse case, the MHDA was also observed on the outsides of the previously patterned ODT features; however, the transport rate was reduced. Furthermore, the shapes of pre-existing patterns of one ink were not changed by deposition of the other ink. These results highlight the important role hydrophobicity plays, both of the substrate as well as of the inks, in determining transport properties and thereby patterns produced in dip-pen nanolithography.
我们通过在同一Au{111}衬底上对16 - 巯基十六烷酸（MHDA）和1 - 十八烷硫醇（ODT）进行图案化，研究了蘸笔纳米光刻中最常用墨水的传输机制。在点（固定针尖）和线（移动针尖）的图案化过程中，使用了几种图案几何形状来探测墨水从针尖到样品的传输。当ODT写在预先存在的MHDA结构之上时，在MHDA结构的外侧观察到了ODT，并且传输速率增加。在相反的情况下，在先前图案化的ODT特征的外侧也观察到了MHDA；然而，传输速率降低了。此外，一种墨水的预先存在图案的形状不会因另一种墨水的沉积而改变。这些结果突出了疏水性在决定传输特性以及由此在蘸笔纳米光刻中产生的图案方面，对衬底和墨水所起的重要作用。
