Zhang Dongxian, Zhang Haijun, He Yulin
State Key Laboratory of Modern Optical Instruments, Zhejiang University, Hangzhou 310027, People's Republic of China.
Microsc Res Tech. 2006 Apr;69(4):267-70. doi: 10.1002/jemt.20311.
This article presents a novel method to measure the in situ thickness of porous alumina (PA) films. The PA films were prepared in oxalic acid at 30, 40, and 60 V direct current. Based on the atomic force microscope measurements, PA film porosities and refractive indexes measurements were acquired. With the observation of the reflectance spectra of PA films over the wavelength range 400-1000 nm, the nondestructive thickness measurement of the PA films were accurate and were found to be 3.66, 7.76, and 11.38 mum, respectively. Experiments showed that when the applied voltage increased, the pores diameters and interpore distances were enlarged, and the interference pattern was stronger and exhibited a greater number of oscillations over the given wavelength range, which indicated that the PA film's thickness increased. Our results match with the theoretical predictions and analysis quite well.
本文提出了一种测量多孔氧化铝（PA）薄膜原位厚度的新方法。PA薄膜是在草酸中以30、40和60V直流电制备的。基于原子力显微镜测量，获得了PA薄膜的孔隙率和折射率测量结果。通过观察PA薄膜在400 - 1000nm波长范围内的反射光谱，PA薄膜的无损厚度测量结果准确，分别为3.66、7.76和11.38μm。实验表明，当施加电压增加时，孔径和孔间距增大，干涉图样更强，并且在给定波长范围内表现出更多的振荡，这表明PA薄膜的厚度增加。我们的结果与理论预测和分析相当吻合。
