Colley Anna L, Williams Cara G, D'Haenens Johansson Ulrika, Newton Mark E, Unwin Patrick R, Wilson Neil R, Macpherson Julie V
Department of Chemistry and Department of Physics, University of Warwick, Coventry, CV4 7AL UK.
Anal Chem. 2006 Apr 15;78(8):2539-48. doi: 10.1021/ac0520994.
Spatial variations in the electrical and electrochemical activity of microarray electrodes, fabricated entirely from diamond, have been investigated. The arrays contain approximately 50-mum-diameter boron-doped diamond (BDD) disks spaced 250 mum apart (center to center) in insulating intrinsic diamond supports, such that the BDD regions are coplanar with the intrinsic diamond. Atomic force microscopy (AFM) imaging of the surface reveals a roughness of no more than +/-10 nm over the array. Each BDD microdisk within the array contains polycrystalline BDD with a variety of different grains exposed. Using conducting-AFM, the conductivity of the different grains was found to vary within a BDD microdisk. Electrochemical imaging of the electroactivity of the microdisk electrodes using scanning electrochemical microscopy operating in substrate generation-tip collection mode revealed that, under apparently diffusion-limited steady-state conditions, there was a small variation in the response between electrodes. However, the majority of electrodes in the array appeared to show predominantly metallic behavior. For the electrodes that showed a lower activity, all grains within the microdisk supported electron transfer, albeit at different rates, as evidenced by studies on the electrodeposition of metallic silver, at potentials far negative of the flat band potential of oxygen-terminated polycrystalline diamond. The possibility of using these array electrodes for steady-state diffusion-limited measurements in electroanalytical applications is far-reaching. However, caution should be exercised in the kinetic analysis of voltammetric measurements, since wide variations in the electroactivity of individual grains are apparent when the potential is below the diffusion-limited value.
对完全由金刚石制成的微阵列电极的电学和电化学活性的空间变化进行了研究。这些阵列包含直径约50μm的掺硼金刚石(BDD)圆盘,在绝缘的本征金刚石支撑体中彼此间隔250μm(中心到中心),使得BDD区域与本征金刚石共面。表面的原子力显微镜(AFM)成像显示阵列上的粗糙度不超过±10nm。阵列中的每个BDD微盘都包含多晶BDD,有各种不同的晶粒暴露在外。使用导电AFM发现,在一个BDD微盘内不同晶粒的电导率有所不同。使用在基底产生-尖端收集模式下操作的扫描电化学显微镜对微盘电极的电活性进行电化学成像表明,在明显受扩散限制的稳态条件下,电极之间的响应存在微小变化。然而,阵列中的大多数电极似乎主要表现出金属行为。对于活性较低的电极,微盘内的所有晶粒都支持电子转移,尽管速率不同,这通过在远低于氧端多晶金刚石平带电位的电位下对金属银电沉积的研究得到了证明。在电分析应用中使用这些阵列电极进行稳态扩散限制测量的可能性是深远的。然而,在伏安测量的动力学分析中应谨慎,因为当电位低于扩散限制值时,单个晶粒的电活性会有很大变化。