AFRC Photosynthesis Research Group, Wolfson Laboratories, Department of Biochemistry, Imperial College of Science, Technology, and Medicine, London SW7 2AY, United Kingdom.
Plant Physiol. 1992 May;99(1):16-20. doi: 10.1104/pp.99.1.16.
Photosystem II (PSII)-enriched membrane particles were isolated from peas (Pisum sativum L.) and treated in several different ways to inhibit the water oxidation reactions, but not reaction center function itself, as judged by the light-induced rate of reduction of 2,6-dichlorophenol indophenol with and without the artificial electron donor, diphenyl carbazide. It was shown that such treatments increased the susceptibility of the PSII-enriched membranes to photoinhibition. This trend was further observed if 2,6-dichlorophenol indophenol was present during the illumination with photoinhibitory light. On the other hand, protection against the enhanced photoinhibition was found when the water-splitting activity was reconstituted or when the artificial electron donor diphenyl carbazide was present during the preillumination. The results indicate that irreversible photodamage occurred within the PSII reaction center as a consequence of illumination with strong light and that the rate of this damage was enhanced under conditions that are expected to give rise to a photoaccumulation of oxidizing species such as P680(+) on the donor side of PSII. This mechanism of photoinhibitory damage occurred under both aerobic and anaerobic conditions.
从豌豆(Pisum sativum L.)中分离出富含光系统 II(PSII)的膜颗粒,并通过几种不同的方法处理,以抑制水氧化反应,但不影响反应中心本身的功能,这可以通过有和没有人工电子供体二苯卡巴肼的情况下,光诱导 2,6-二氯苯酚靛酚的还原速率来判断。结果表明,这种处理会增加富含 PSII 的膜对光抑制的敏感性。如果在光抑制光照射期间存在 2,6-二氯苯酚靛酚,则会进一步观察到这种趋势。另一方面,当水分解活性被重建或在预照射期间存在人工电子供体二苯卡巴肼时,发现对增强的光抑制有保护作用。结果表明,由于强光照射,PSII 反应中心内发生了不可逆的光损伤,并且在预计会导致 PSII 供体侧氧化物种(如 P680(+))积累的条件下,这种损伤的速度会加快。这种光抑制损伤的机制在有氧和无氧条件下都能发生。