Terauchi M
Institute for Multidisciplinary Research for Advanced Materials, Tohoku University, Sendai 980-8577, Japan.
Microsc Res Tech. 2006 Jul;69(7):531-7. doi: 10.1002/jemt.20323.
Electronic structures of boron-nitride (BN) nanotubes and a BN cone-structure material were studied by using a high energy-resolution electron energy-loss spectroscopy (EELS) microscope. A trial of the whole electronic structure study of hexagonal BN (h-BN), which consists of flat BN honeycomb layers, was conducted by a combination of EELS and X-ray emission spectroscopy (XES) based on transmission electron microscopy (TEM) (TEM-EELS/XES). The pi and pi+sigma plasmon energies of BN nanotubes (BNT) were smaller than those of h-BN. The pi+sigma energy was explained by the surface plasmon excitation. The spectrum of a two-wall BNT of 2.7 nm in diameter showed a new spectral onset at 4 eV. The valence electron excitation spectra obtained from the tip region of the BN cone with an apex angle of 20 degrees showed similar intensity distribution with those of BNTs. The B K-shell electron excitation spectra obtained from the bottom edge region of the BN cone showed additional peak intensity when compared with those of h-BN and BNT. The B K-shell electron excitation spectra and B K-emission spectra of h-BN were compared with a result of a LDA band calculation. It showed that high symmetry points in the band diagram appear as peak and/or shoulder structures in the EELS and XES spectra. Interband transitions appeared in the imaginary part of the dielectric function of h-BN experimentally obtained were assigned in the band diagram. The analysis also presented that the LDA calculation estimated the bandgap energy smaller than the real material by an amount of 2 eV. Those results of TEM-EELS/XES analysis presented that high energy-resolution spectroscopy methods combined with TEM is a promising method to analyze whole electronic structures of nanometer scale materials.
利用高能量分辨率电子能量损失谱(EELS)显微镜研究了氮化硼(BN)纳米管和BN锥形结构材料的电子结构。基于透射电子显微镜(TEM)(TEM-EELS/XES),通过EELS和X射线发射光谱(XES)相结合的方法,对由扁平BN蜂窝层组成的六方BN(h-BN)的整体电子结构进行了研究。BN纳米管(BNT)的π和π+σ等离子体能量小于h-BN的。π+σ能量可由表面等离子体激元激发来解释。直径为2.7nm的双壁BNT的光谱在4eV处显示出一个新的光谱起始点。从顶角为20度的BN锥尖区域获得的价电子激发光谱显示出与BNT相似的强度分布。与h-BN和BNT相比,从BN锥底部边缘区域获得的B K壳层电子激发光谱显示出额外的峰强度。将h-BN的B K壳层电子激发光谱和B K发射光谱与LDA能带计算结果进行了比较。结果表明,能带图中的高对称点在EELS和XES光谱中表现为峰和/或肩结构。实验获得的h-BN介电函数虚部中出现的带间跃迁在能带图中得到了归属。分析还表明,LDA计算估计的带隙能量比实际材料小2eV。TEM-EELS/XES分析的这些结果表明,结合TEM的高能量分辨率光谱方法是分析纳米尺度材料整体电子结构的一种有前途的方法。