Herceg Eldad, Mudiyanselage Kumudu, Trenary Michael
Department of Chemistry, University of Illinois at Chicago, 845 West Taylor Street, Chicago, Illinois 60607-7061, USA.
J Phys Chem B. 2005 Feb 24;109(7):2828-35. doi: 10.1021/jp046899e.
The formation and dissociation chemistry of the NH species on Pt(111) was characterized with reflection absorption infrared spectroscopy and temperature programmed desorption. Irradiation of a chemisorbed bilayer of ammonia with a 100 eV electron beam at 85 K leads to a mixture of NH, N, and H on the surface. Annealing to temperatures in the range of 200-300 K leads to reaction of N and H to form additional NH. The NH species has an intense and narrow NH stretch peak at 3320 cm(-1), while no peak due to the PtNH bend is observed above 800 cm(-1). The NH species is stable up to a temperature of approximately 400 K. The surface N atoms produced from NH dissociation are readily hydrogenated back to NH by exposure of the surface to H2. However, NH cannot be further hydrogenated to generate adsorbed NH2 or to NH3 under the conditions used here. Exposure of the NH/Pt(111) surface to D2 at 380 K produces the ND species. Comparison with the results of density functional theory calculations based on small Pt clusters indicates that NH occupies three-fold hollow sites with the molecular axis perpendicular to the surface.
利用反射吸收红外光谱和程序升温脱附对Pt(111)表面NH物种的形成和解离化学进行了表征。在85K下用100eV电子束辐照化学吸附的双层氨会在表面产生NH、N和H的混合物。将温度升至200 - 300K会导致N和H反应生成额外的NH。NH物种在3320cm⁻¹处有一个强烈且狭窄的NH伸缩峰,而在800cm⁻¹以上未观察到由于PtNH弯曲产生的峰。NH物种在大约400K的温度下都是稳定的。由NH解离产生的表面N原子通过将表面暴露于H₂很容易被氢化回NH。然而,在此处使用的条件下,NH不能进一步氢化生成吸附的NH₂或NH₃。在380K下将NH/Pt(111)表面暴露于D₂会产生ND物种。与基于小Pt团簇的密度泛函理论计算结果比较表明,NH占据三重空心位,分子轴垂直于表面。