Xiaowei Li, Mingmin Shen, Xi Hong, Haiyang Zhu, Fei Gao, Yan Kong, Lin Dong, Yi Chen
Key Laboratory of Mesoscopic Chemistry, Department of Chemistry, Nanjing University, Nanjing 210093, People's Republic of China.
J Phys Chem B. 2005 Mar 10;109(9):3949-55. doi: 10.1021/jp046731t.
XRD (X-ray diffraction), BET (Brunauer-Emmett-Teller), LRS (laser Raman spectra), XPS (X-ray photoelectron spectroscopy), and TPR (temperature-programmed reduction) are used to investigate the surface properties of CuO/WO3/Ce(0.5)Zr(0.5)O2 samples. The results indicate that (1) tungsten oxide can be highly dispersed on Ce(0.5)Zr(0.5)O2 (denoted as CZ hereafter) solid solution, with a dispersion capacity of about 0.8 mmol WO(3)/(100 m2 CZ), and comparatively, the supported tungsten oxide species are preferentially interacted with ceria component on the surface of CZ; (2) for CuO/WO3/CZ samples with a half-monolayer WO3 loading, i.e., xCu-0.4W-CZ series, the surface of CZ is only partially covered by the preloaded WO3) and the supported copper oxide species are dispersed on the remaining surface vacant sites on CZ as well as on top of the preloaded tungsten oxide, while for the samples preloaded with a full-monolayer WO3, i.e., xCu-0.8W-CZ series, only dispersed on the top of the preloaded tungsten oxide monolayer; (3) the effect of the loading amount of WO3 on the reduction property of Cu2+ ions in a series of CuO/WO3/CZ samples has been observed and tentatively attributed to the formation of WO3 monolayer on CZ and the different coordination environments of the dispersed Cu2+ ions are discussed on the basis of the consideration of the incorporation model proposed previously (Chen, Y.; Zhang, L. Catal. Lett. 1992, 12, 51).
采用X射线衍射（XRD）、布鲁诺尔-埃米特-泰勒（BET）法、激光拉曼光谱（LRS）、X射线光电子能谱（XPS）和程序升温还原（TPR）对CuO/WO3/Ce(0.5)Zr(0.5)O2样品的表面性质进行了研究。结果表明：（1）氧化钨可高度分散在Ce(0.5)Zr(0.5)O2（以下简称CZ）固溶体上，分散容量约为0.8 mmol WO(3)/(100 m2 CZ)，相比之下，负载的氧化钨物种优先与CZ表面的二氧化铈组分相互作用；（2）对于负载半单层WO3的CuO/WO3/CZ样品，即xCu-0.4W-CZ系列，CZ表面仅部分被预负载的WO3覆盖，负载的氧化铜物种分散在CZ上剩余的表面空位以及预负载的氧化钨顶部，而对于预负载全单层WO3的样品，即xCu-0.8W-CZ系列，仅分散在预负载的氧化钨单层顶部；（3）观察到了一系列CuO/WO3/CZ样品中WO3负载量对Cu2+离子还原性能的影响，并初步归因于在CZ上形成了WO3单层，基于先前提出的掺入模型（Chen, Y.; Zhang, L. Catal. Lett. 1992, 12, 51）讨论了分散的Cu2+离子的不同配位环境。
