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结合压电石英晶体阻抗分析的扫描电化学显微镜用于研究聚(邻苯二胺)薄膜的生长、电化学以及微蚀刻。

Scanning electrochemical microscopy in combination with piezoelectric quartz crystal impedance analysis for studying the growth and electrochemistry as well as microetching of poly(o-phenylenediamine) thin films.

作者信息

Tu Xinman, Xie Qingji, Xiang Canhui, Zhang Youyu, Yao Shouzhuo

机构信息

Key Laboratory of Chemical Biology and Traditional Chinese Medicine Research (Hunan Normal University), Ministry of Education, Hunan Normal University, Changsha 410081, People's Republic of China.

出版信息

J Phys Chem B. 2005 Mar 10;109(9):4053-63. doi: 10.1021/jp044731n.

Abstract

The combination of scanning electrochemical microscopy (SECM) with piezoelectric quartz crystal impedance (PQCI) analysis was proposed as a novel multiparameter method for investigating the cyclic voltammetric growth of poly(o-phenylenediamine) (PoPD) thin films at Au electrodes in aqueous solutions of various pH values and the potentiostatic microetching (localized degradation) of these films in 0.10 mol/L aqueous H2SO4 for comparative examinations on polymer porosity and stability. Two potential-sweep ranges, -0.4 to 0.9 (I) and 0 to 0.9 (II) V versus SCE, and four solutions, acidic (A, 0.20 mol/L H2SO4 + 0.10 mol/L Na2SO4; B, 0.10 mol/L H2SO4 + 0.20 mol/L Na2SO4), neutral (C, 0.10 mol/L PBS + 0.20 mol/L Na2SO4, pH 7.2), and alkaline (D, 0.20 mol/L NaOH + 0.20 mol/L Na2SO4) aqueous solutions, were selected for PoPD growth. The pH increase for the polymerization solution increased the molar percentage of polyaniline-like chains in PoPD, as quantified from the current peaks at approximately 0.6 V versus a saturated calomel electrode (SCE) for the oxidation of -NH2 groups in as-prepared PoPD (grown from solutions C and D) during their redox switching in 0.10 mol/L aqueous H2SO4 for the first time. The unusual PQCI responses observed at negative potentials (potential range I) in the first several potential cycles during the cyclic voltammetric growth of PoPD in acidic and neutral solutions have been reasonably explained as being due to the precipitation/dissolution of the poorly soluble phenazinehydrine charge-transfer complexes developed during redox switching of oligomers for the first time, which brought about much less compact PoPD films and their higher degradability than those grown in the same solution but over potential range II. SECM, scanning electron microscopy (SEM), and piezoelectric quartz crystal (PQC) frequency were used to estimate the sizes of etched microscale spots. In addition, the x-, y-, or z-axis movement of a Pt microelectrode of 25-mum diameter near the PQC electrode was found to influence negligibly the PQCI responses in 1.0 mol/L aqueous Na2SO4 containing K4Fe(CN)6 up to 0.10 mol/L, and a new protocol of dynamically electrodepositing silver microwires via the chemical-lens method was proposed for examining the local mass-sensitivity distribution on the PQC surface.

摘要

扫描电化学显微镜(SECM)与压电石英晶体阻抗(PQCI)分析相结合,被提议作为一种新型多参数方法,用于研究在不同pH值水溶液中,聚(邻苯二胺)(PoPD)薄膜在金电极上的循环伏安生长,以及这些薄膜在0.10 mol/L H₂SO₄水溶液中的恒电位微蚀刻(局部降解),以对聚合物的孔隙率和稳定性进行对比研究。选择了两个电位扫描范围,相对于饱和甘汞电极(SCE)为-0.4至0.9(I)和0至0.9(II)V,以及四种溶液,酸性溶液(A,0.20 mol/L H₂SO₄ + 0.10 mol/L Na₂SO₄;B,0.10 mol/L H₂SO₄ + 0.20 mol/L Na₂SO₄)、中性溶液(C,0.10 mol/L PBS + 0.20 mol/L Na₂SO₄,pH 7.2)和碱性溶液(D,0.20 mol/L NaOH + 0.20 mol/L Na₂SO₄)用于PoPD生长。聚合溶液的pH升高增加了PoPD中聚苯胺类链的摩尔百分比,这是首次通过在0.10 mol/L H₂SO₄中对制备的PoPD(从溶液C和D中生长)进行氧化还原转换时,相对于饱和甘汞电极(SCE)在约0.6 V处的电流峰进行定量得出的,该电流峰对应于-NH₂基团的氧化。在酸性和中性溶液中PoPD循环伏安生长的最初几个电位循环中,在负电位(电位范围I)观察到的异常PQCI响应已得到合理的解释,这是由于低聚物氧化还原转换过程中形成的难溶性吩嗪肼电荷转移络合物的沉淀/溶解,这导致PoPD薄膜比在相同溶液但电位范围II上生长的薄膜更不致密且降解性更高。使用SECM、扫描电子显微镜(SEM)和压电石英晶体(PQC)频率来估计蚀刻微尺度斑点的大小。此外,发现在PQC电极附近直径为25μm的Pt微电极在x、y或z轴上的移动对含有高达0.10 mol/L K₄Fe(CN)₆的1.0 mol/L Na₂SO₄水溶液中的PQCI响应影响可忽略不计,并提出了一种通过化学透镜法动态电沉积银微丝的新方案,用于检查PQC表面的局部质量敏感性分布。

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