Kurten Theo, Biczysko Małgorzata, Rajamäki Timo, Laasonen Kari, Halonen Lauri
Laboratory of Physical Chemistry, P.O. Box 55 (A.I. Virtasen aukio 1), FIN-00014 University of Helsinki, Finland.
J Phys Chem B. 2005 May 12;109(18):8954-60. doi: 10.1021/jp044326w.
The structure and stabilities of NH(3) adsorbed on different sites of a Ni(111) surface are compared based on density functional, plane-waves calculations within a periodic framework. The surface has been modeled by 4- and 5-layer slabs with 2 x 2 and 3 x 3 unit cells. Calculated results are in good agreement with available experimental data, confirming the atop adsorption site to be the most favorable, with no preferred azimuthal orientation for the H atoms. For NH(3) adsorbed at the atop site, the one-dimensional potential energy profiles along the N-H and N-Ni bonds and the coupling between adjacent N-H bond oscillators have been calculated and fitted to an analytical expression using an accurate anharmonic potential model. Variational calculations have been performed to obtain frequencies for the N-H and N-Ni stretching vibrations and N-H stretching line widths. The model for calculating line widths has also been tested with CO adsorbed at the hcp hollow of the Ni(111) surface.
基于密度泛函理论,在周期性框架内进行平面波计算,比较了吸附在Ni(111)表面不同位置的NH₃的结构和稳定性。表面采用具有2×2和3×3晶胞的4层和5层平板模型。计算结果与现有实验数据吻合良好,证实顶位吸附是最有利的,H原子没有优先的方位取向。对于吸附在顶位的NH₃,计算了沿N - H键和N - Ni键的一维势能分布以及相邻N - H键振子之间的耦合,并使用精确的非谐势模型将其拟合为解析表达式。进行了变分计算以获得N - H和N - Ni伸缩振动的频率以及N - H伸缩线宽。用于计算线宽的模型也已用吸附在Ni(111)表面hcp空位处的CO进行了测试。