Zubkov Tatiana, Lucassen André C B, Freeman Dalia, Feldman Yishay, Cohen Sidney R, Evmenenko Guennadi, Dutta Pulak, van der Boom M E
Department of Organic Chemistry, Department of Chemical Research Support, The Weizmann Institute of Science, Rehovot 76100, Israel.
J Phys Chem B. 2005 Jul 28;109(29):14144-53. doi: 10.1021/jp0517854.
Trimethoxy-[11-(2-nitrobenzyloxy)undecyl]silane (1) and trimethoxy-[17-(2-nitrobenzyloxy)heptadecyl]silane (2) have been used for the covalent assembly of siloxane-based photopatternable monolayers. Exposing the monolayers to UV light (312 +/- 10 nm) results in the generation of reactive hydroxyl-terminated monolayers without affecting the film quality. The new monolayers, deprotection chemistry, and the effect of photoinduced headgroup lift-off on the monolayer microstructure have been studied in detail by a full complement of physicochemical techniques, including optical (UV-vis) spectroscopy, ellipsometry, aqueous contact angle (CA) measurements, X-ray photoelectron spectroscopy (XPS), synchrotron X-ray reflectivity (XRR), and atomic force microscopy (AFM and AFM-force spectroscopy). AFM-force spectroscopy was used to analyze hydrogen-bond interactions as a function of the nature of the solid-liquid interface. AFM-force spectroscopy indicates a hydrogen-bond energy for photodeprotected monolayers of 8.2 kJ mol(-1) (approximately 2 kcal mol(-1)). Scanning electron microscopy (SEM) revealed that treatment of photopatterned monolayers with ZnEt2 solutions resulted in well-defined approximately 2 microm x 2 microm features of 10 A thick ZnO layers.
三甲氧基-[11-(2-硝基苄氧基)十一烷基]硅烷(1)和三甲氧基-[17-(2-硝基苄氧基)十七烷基]硅烷(2)已用于基于硅氧烷的可光图案化单分子层的共价组装。将单分子层暴露于紫外光(312±10 nm)会产生反应性羟基封端的单分子层，而不会影响膜质量。通过包括光学(紫外-可见)光谱、椭偏仪、水接触角(CA)测量、X射线光电子能谱(XPS)、同步加速器X射线反射率(XRR)和原子力显微镜(AFM和AFM力谱)在内的一整套物理化学技术，对新的单分子层、脱保护化学以及光诱导头基剥离对单分子层微观结构的影响进行了详细研究。AFM力谱用于分析作为固液界面性质函数的氢键相互作用。AFM力谱表明光脱保护单分子层的氢键能量为8.2 kJ mol(-1)(约2 kcal mol(-1))。扫描电子显微镜(SEM)显示，用二乙基锌溶液处理光图案化单分子层会产生定义明确的约2微米×2微米、厚度为10埃的氧化锌层特征。
