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绝缘体上硅衬底上光子晶体平板超透镜中光的负折射聚焦

Focusing of light by negative refraction in a photonic crystal slab superlens on silicon-on-insulator substrate.

作者信息

Matsumoto Takashi, Eom Kun-Sun, Baba Toshihiko

机构信息

Department of Electrical and Computer Engineering, Yokohama National University, Yokohama, Japan.

出版信息

Opt Lett. 2006 Sep 15;31(18):2786-8. doi: 10.1364/ol.31.002786.

Abstract

We experimentally demonstrate the light focusing by negative refraction in a photonic crystal slab superlens at wavelengths lambda of 1.26-1.42 microm. The photonic crystal slab was fabricated on silicon-on-insulator substrate with an interface structure optimized for low reflection and diffraction losses. The light focusing in the photonic crystal slab was clearly observed through the intentional out-of-plane radiation or scattering of guided light in the slab. The minimum focused spot width was limited to 1.8 microm(1.4 lambda) owing to aberrations. The focusing characteristics were in good agreement with those obtained from photonic band and finite-difference time-domain analyses.

摘要

我们通过实验证明了在波长为1.26 - 1.42微米的光子晶体平板超透镜中,光可通过负折射实现聚焦。该光子晶体平板是在绝缘体上硅衬底上制造的,其界面结构经过优化,以降低反射和衍射损耗。通过有意使平板中的导光发生面外辐射或散射,清晰地观察到了光子晶体平板中的光聚焦现象。由于像差,最小聚焦光斑宽度限制为1.8微米(1.4λ)。聚焦特性与从光子带和时域有限差分分析中获得的结果高度吻合。

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