在100纳米厚的氮化硅膜中制造纳米孔。

Fabrication of nanopores in a 100-nm thick Si3N4 membrane.

作者信息

Chungt Jae-Hyun, Chen Xinqi, Zimney Eric J, Ruoff Rodney S

机构信息

Department of Mechanical Engineering, Northwestern University, Evanston, IL 60208, USA.

出版信息

J Nanosci Nanotechnol. 2006 Jul;6(7):2175-81. doi: 10.1166/jnn.2006.366.

DOI:10.1166/jnn.2006.366

PMID:17025145

Abstract

Textured alumina films have been used to fabricate nanoscale pores in Si3N4 membranes. A few nanometer-thick alumina layer was used as a masking material for nanopore fabrication, and the pattern was transferred into a 100-nm thick, 200 microm x 200 microm Si3N4 membrane by reactive ion etching (RIE). The nanopores were found to be concentrated in a approximately 150-microm diameter region at the center of the membrane.

摘要

纹理氧化铝薄膜已被用于在氮化硅膜中制造纳米级孔隙。几纳米厚的氧化铝层被用作纳米孔制造的掩膜材料，通过反应离子蚀刻（RIE）将图案转移到100纳米厚、200微米×200微米的氮化硅膜中。发现纳米孔集中在膜中心直径约150微米的区域。