Shao D B, Chen S C
Mechanical Engineering Department and Center for Nano and Molecular Science and Technology, The University of Texas at Austin, Austin, Texas 78712, USA.
Nano Lett. 2006 Oct;6(10):2279-83. doi: 10.1021/nl061712b.
The technical applications of three-dimensional (3D) nanostructures demand a fabrication technique that is convenient and yet offers design flexibility. We describe here a nanofabrication technique called surface-plasmon-assisted three-dimensional nanolithography (3D-SPAN). By utilizing optical near-field interference patterns generated by surface plasmons (SPs), we have fabricated different 2D/3D periodic polymeric nanostructures in a typical photolithography setup. We have also shown here that the nanostructures fabricated by 3D-SPAN can be controlled easily in terms of size, layout, and defects by designing the SPAN mask. Because of its design flexibility and fabrication convenience, 3D-SPAN could be used to develop "photonics on a chip", where signal processing is carried out by photons instead of electrons and be extended to other applications of direct-writing 3D functional nanostructures.
三维（3D）纳米结构的技术应用需要一种既方便又具有设计灵活性的制造技术。我们在此描述一种名为表面等离子体辅助三维纳米光刻（3D-SPAN）的纳米制造技术。通过利用表面等离子体（SPs）产生的光学近场干涉图案，我们在典型的光刻装置中制造了不同的二维/三维周期性聚合物纳米结构。我们还在此表明，通过设计SPAN掩模，可以轻松控制由3D-SPAN制造的纳米结构的尺寸、布局和缺陷。由于其设计灵活性和制造便利性，3D-SPAN可用于开发“芯片上的光子学”，其中信号处理由光子而非电子进行，并可扩展到直接写入三维功能纳米结构的其他应用。
