Dholakia Geetha R, Meyyappan M, Facchetti Antonio, Marks Tobin J
Center for Nanotechnology, NASA Ames Research Center, Moffett Field, California 94035-1000, USA.
Nano Lett. 2006 Nov;6(11):2447-55. doi: 10.1021/nl061566+.
The evolution in growth morphology and molecular orientation of n-type semiconducting alpha,omega-diperfluorohexyl-quaterthiophene (DFH-4T) on Au(111) is investigated by scanning tunneling microscopy and scanning tunneling spectroscopy as the film thickness is increased from one monolayer to multilayers. Monolayer-thick DFH-4T films are amorphous and morphologically featureless with a large pit density, whereas multilayer films exhibit drastically different terraced structures consisting of overlapping platelets. Large changes in DFH-4T molecular orientation are observed on transitioning from two to four monolayers. Parallel electrical characterization of top-versus-bottom contact configuration DFH-4T FETs with Au source/drain electrodes reveals greatly different mobilities (mu(TOP) = 1.1 +/- 0.2 10(-2) cm(2)V(-1)s(-1) versus mu(BOTTOM) = 2.3 +/- 0.5 10(-5) cm(2)V(-1)s(-1)) and contact resistances (R(C-TOP) = 4-12 MOmegacm vs R(C-BOTTOM) > 1 GOmegacm). This study provides important information on the organic semiconductor-source\drain electrode interfaces and explains why top-contact OFET devices typically have superior performance. By direct visualization, it demonstrates that the DFH-4T film growth transition from monolayer to multilayer on Au is accompanied by dramatic morphology and molecular orientation changes, starting from an amorphous, pitted, and disordered monolayer, to crystalline and smooth bi/tetralayers but with the molecules reoriented by 90 degrees . These chemisorption-derived inhomogenities at the contact-molecule interface and the large monolayer --> multilayer --> bulk microstructural changes are in accord with the large bottom-contact device resistance and poor OFET performance.
通过扫描隧道显微镜和扫描隧道光谱,研究了n型半导体α,ω-二氟己基-四噻吩(DFH-4T)在Au(111)上随着膜厚度从单层增加到多层时生长形态和分子取向的演变。单层厚度的DFH-4T薄膜是无定形的,形态上无特征且具有大的坑密度,而多层薄膜则呈现出由重叠薄片组成的截然不同的梯田状结构。在从两层到四层的转变过程中,观察到DFH-4T分子取向有很大变化。对具有Au源极/漏极电极的顶接触与底接触配置DFH-4T场效应晶体管进行的并行电学表征显示,迁移率(μ(TOP) = 1.1 ± 0.2×10⁻² cm²V⁻¹s⁻¹ 与 μ(BOTTOM) = 2.3 ± 0.5×10⁻⁵ cm²V⁻¹s⁻¹)和接触电阻(R(C-TOP) = 4 - 12 MΩ·cm 与 R(C-BOTTOM) > 1 GΩ·cm)有很大差异。这项研究提供了关于有机半导体 - 源极/漏极电极界面的重要信息,并解释了为什么顶接触有机场效应晶体管器件通常具有优异的性能。通过直接可视化,表明DFH-4T薄膜在Au上从单层到多层的生长转变伴随着显著的形态和分子取向变化,从无定形、有坑且无序的单层开始,到结晶且光滑的双层/四层,但分子重新取向了90度。接触 - 分子界面处这些由化学吸附产生的不均匀性以及从单层到多层再到体相的大微观结构变化与底接触器件的高电阻和较差的有机场效应晶体管性能一致。