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基底表面对半结晶嵌段共聚物薄膜去湿行为和链取向的影响。

Effect of substrate surface on dewetting behavior and chain orientation of semicrystalline block copolymer thin films.

作者信息

Liang Guo-Dong, Xu Jun-Ting, Fan Zhi-Qiang, Mai Shao-Min, Ryan Anthony J

机构信息

Key Laboratory of Macromolecular Synthesis and Functionalization, Department of Polymer Science and Engineering, Zhejiang University, Hangzhou 310027, China.

出版信息

J Phys Chem B. 2006 Dec 7;110(48):24384-9. doi: 10.1021/jp064008s.

DOI:10.1021/jp064008s
PMID:17134191
Abstract

Three symmetrical semicrystalline oxyethylene/oxybutylene block copolymers (EmBn) were spin-coated on different substrates including silicon, hydrophobically modified silicon, and mica. The effects of surface property on the dewetting behavior of EmBn thin films and the chain orientation of the crystalline block were investigated with atomic force microscopy and grazing incidence X-ray diffraction . The EmBn thin films on silicon exhibit an autophobic dewetting behavior, while ordinary dewetting occurs for the thin films on modified silicon. It was observed that the stems of the E crystals in the first half-polymer layer contacting the mica surface were parallel to the surface, in contrast to the perpendicular chain orientation of the other polymer layers and of the first half-polymer layer on silicon. This is attributed to the strong interaction between the E block and mica, verified by infrared spectra.

摘要

三种对称的半结晶氧化乙烯/氧化丁烯嵌段共聚物(EmBn)旋涂在包括硅、疏水改性硅和云母在内的不同基底上。利用原子力显微镜和掠入射X射线衍射研究了表面性质对EmBn薄膜去湿行为和结晶嵌段链取向的影响。硅上的EmBn薄膜表现出自憎液去湿行为,而改性硅上的薄膜则发生普通去湿。观察到,与云母表面接触的前半聚合物层中E晶体的链干与表面平行,这与其他聚合物层以及硅上的前半聚合物层的链垂直取向形成对比。这归因于E嵌段与云母之间的强相互作用,红外光谱证实了这一点。

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