Bruggmoser G, Saum R, Schmachtenberg A, Schmid F, Schüle E
Univ.-Klinikum Freiburg, Klinik f Strahlenheilkunde, FB Med. Physik, Freiburg, Germany.
Phys Med Biol. 2007 Jan 21;52(2):N35-50. doi: 10.1088/0031-9155/52/2/N01. Epub 2006 Dec 29.
It has been shown from an evaluation of the inverse reading of the dosemeter (1/M) against the inverse of the polarizing voltage (1/V), obtained with a number of commercially available ionization chambers, using dose per pulse values between 0.16 and 5 mGy, that a linear relationship between the recombination correction factor kS and dose per pulse (DPP) can be found. At dose per pulse values above 1 mGy the method of a general equation with coefficients dependent on the chamber type gives more accurate results than the Boag method. This method was already proposed by Burns and McEwen (1998, Phys. Med. Biol. 43 2033) and avoids comprehensive and time-consuming measurements of Jaffé plots which are a prerequisite for the application of the multi-voltage analysis (MVA) or the two-voltage analysis (TVA). We evaluated and verified the response of ionization chambers on the recombination effect in pulsed accelerator beams for both photons and electrons. Our main conclusions are: (1) The correction factor k(S) depends only on the DPP and the chamber type. There is no influence of radiation type and energy. (2) For all the chambers investigated there is a linear relationship between kS and DPP up to 5 mGy/pulse, and for two chambers we could show linearity up to 40 mGy/pulse. (3) A general formalism, such as that of Boag, characterizes chambers exclusively by the distance of the electrodes and gives a trend for the correction factor, and therefore (4) a general formalism has to reflect the influence of the chamber construction on the recombination by the introduction of chamber-type dependent coefficients.
通过对多个商用电离室进行评估,在脉冲剂量值介于0.16至5毫戈瑞之间时,测量剂量仪的倒数读数(1/M)与极化电压的倒数(1/V),结果表明复合修正因子kS与每脉冲剂量(DPP)之间存在线性关系。在每脉冲剂量值高于1毫戈瑞时,使用依赖于电离室类型的系数的通用方程方法比博阿格方法能给出更准确的结果。该方法由伯恩斯和麦克尤恩(1998年,《物理医学与生物学》43卷,2033页)提出,避免了对贾菲图进行全面且耗时的测量,而贾菲图测量是应用多电压分析(MVA)或双电压分析(TVA)的前提条件。我们评估并验证了电离室对脉冲加速器束流中光子和电子复合效应的响应。我们的主要结论如下:(1)修正因子k(S)仅取决于DPP和电离室类型。辐射类型和能量没有影响。(2)对于所有研究的电离室,在每脉冲5毫戈瑞以内,kS与DPP之间存在线性关系,对于两个电离室,我们能够证明在每脉冲40毫戈瑞以内呈线性关系。(3)像博阿格那样的通用形式体系仅通过电极距离来表征电离室,并给出修正因子的趋势,因此(4)通用形式体系必须通过引入依赖于电离室类型的系数来反映电离室结构对复合的影响。