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基于蒙特卡罗技术(eMC)的商用电子治疗计划系统评估。

Evaluation of a commercial electron treatment planning system based on Monte Carlo techniques (eMC).

作者信息

Pemler Peter, Besserer Jürgen, Schneider Uwe, Neuenschwander Hans

机构信息

Klinik für Radio-Onkologie und Nuklearmedizin, Stadtspital Triemli, Zürich.

出版信息

Z Med Phys. 2006;16(4):313-29. doi: 10.1078/0939-3889-00330.

DOI:10.1078/0939-3889-00330
PMID:17216757
Abstract

A commercial electron beam treatment planning system on the basis of a Monte Carlo algorithm (Varian Eclipse, eMC V7.2.35) was evaluated. Measured dose distributions were used for comparison with dose distributions predicted by eMC calculations. Tests were carried out for various applicators and field sizes, irregular shaped cut outs and an inhomogeneity phantom for energies between 6 Me V and 22 MeV Monitor units were calculated for all applicator/energy combinations and field sizes down to 3 cm diameter and source-to-surface distances of 100 cm and 110 cm. A mass-density-to-Hounsfield-Units calibration was performed to compare dose distributions calculated with a default and an individual calibration. The relationship between calculation parameters of the eMC and the resulting dose distribution was studied in detail. Finally, the algorithm was also applied to a clinical case (boost treatment of the breast) to reveal possible problems in the implementation. For standard geometries there was a good agreement between measurements and calculations, except for profiles for low energies (6 MeV) and high energies (18 Me V 22 MeV), in which cases the algorithm overestimated the dose off-axis in the high-dose region. For energies of 12 MeV and higher there were oscillations in the plateau region of the corresponding depth dose curves calculated with a grid size of 1 mm. With irregular cut outs, an overestimation of the dose was observed for small slits and low energies (4% for 6 MeV), as well as for asymmetric cases and extended source-to-surface distances (12% for SSD = 120 cm). While all monitor unit calculations for SSD = 100 cm were within 3% compared to measure-ments, there were large deviations for small cut outs and source-to-surface distances larger than 100 cm (7%for a 3 cm diameter cut-out and a source-to-surface distance of 10 cm).

摘要

对基于蒙特卡罗算法的商用电子束治疗计划系统(瓦里安 Eclipse,eMC V7.2.35)进行了评估。使用测量的剂量分布与 eMC 计算预测的剂量分布进行比较。针对各种施源器和射野大小、不规则形状的限束装置以及能量在 6 MeV 至 22 MeV 之间的不均匀性模体进行了测试。针对所有施源器/能量组合以及直径小至 3 cm 且源皮距为 100 cm 和 110 cm 的射野大小计算了监测单位。进行了质量密度到亨氏单位的校准,以比较使用默认校准和个体校准计算的剂量分布。详细研究了 eMC 的计算参数与所得剂量分布之间的关系。最后,该算法还应用于一个临床病例(乳腺的加量治疗)以揭示实施过程中可能存在的问题。对于标准几何形状,测量值与计算值之间有良好的一致性,但对于低能量(6 MeV)和高能量(18 MeV、22 MeV)的剖面除外,在这些情况下,该算法在高剂量区域高估了离轴剂量。对于 12 MeV 及更高能量,使用 1 mm 的网格大小计算的相应深度剂量曲线的坪区存在振荡。对于不规则限束装置,在小狭缝和低能量(6 MeV 时为 4%)以及不对称情况和较大源皮距(源皮距 = 120 cm 时为 12%)下观察到剂量高估。虽然与测量值相比,源皮距 = 100 cm 时所有监测单位的计算值均在 3%以内,但对于小的限束装置和源皮距大于 100 cm 的情况存在较大偏差(直径 3 cm 的限束装置和源皮距 10 cm 时为 7%)。

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