Lee Eung-Sug, Jeong Jun-Ho, Kim Ki-Don, Sim Young-Suk, Choi Dae-Geun, Choi Junhyuk, Park Sang-Hu, Lim Tae-Woo, Yang Dong-Yol, Cha Nam-Goo, Park Jin-Goo, Lee Wi-Ro
Nano-Mechanical Systems Research Center Korea Institute of Machinery and Materials, Daejeon, Korea.
J Nanosci Nanotechnol. 2006 Nov;6(11):3619-23.
Two-dimensional (2-D) and three-dimensional (3-D) diamond-like carbon (DLC) stamps for ultraviolet nanoimprint lithography were fabricated with two methods: namely, a DLC coating process, followed by focused ion beam lithography; and two-photon polymerization patterning, followed by nanoscale-thick DLC coating. We used focused ion beam lithography to fabricate 70 nm deep lines with a width of 100 nm, as well as 70 nm deep lines with a width of 150 nm, on 100 nm thick DLC layers coated on quartz substrates. We also used two-photon polymerization patterning and a DLC coating process to successfully fabricate 200 nm wide lines, as well as 3-D rings with a diameter of 1.35 microm and a height of 1.97 microm, and a 3-D cone with a bottom diameter of 2.88 microm and a height of 1.97 microm. The wafers were successfully printed on an UV-NIL using the DLC stamps without an anti-adhesive layer. The correlation between the dimensions of the stamp's features and the corresponding imprinted features was excellent.
采用两种方法制备了用于紫外纳米压印光刻的二维(2-D)和三维(3-D)类金刚石碳(DLC)印章:即先进行DLC涂层工艺,再进行聚焦离子束光刻;以及先进行双光子聚合图案化,再进行纳米级厚度的DLC涂层。我们使用聚焦离子束光刻在涂覆于石英衬底上的100 nm厚DLC层上制备了宽度为100 nm、深度为70 nm的线条,以及宽度为150 nm、深度为70 nm的线条。我们还使用双光子聚合图案化和DLC涂层工艺成功制备了宽度为200 nm的线条,以及直径为1.35微米、高度为1.97微米的三维环,和底部直径为2.88微米、高度为1.97微米的三维圆锥。使用这些没有抗粘层的DLC印章成功地在紫外纳米压印光刻中对晶圆进行了压印。印章特征尺寸与相应压印特征之间的相关性非常好。