Truskett Van N, Watts Michael P C
Molecular Imprints, Inc., Austin, TX 78758, USA.
Trends Biotechnol. 2006 Jul;24(7):312-7. doi: 10.1016/j.tibtech.2006.05.005. Epub 2006 Jun 6.
Imprint lithography is emerging as an alternative nano-patterning technology to traditional photolithography that permits the fabrication of 2D and 3D structures with <100 nm resolution, patterning and modification of functional materials other than photoresist and is low cost, with operational ease for use in developing bio-devices. Techniques for imprint lithography, categorized as either 'molding and embossing' or 'transfer printing', will be discussed in the context of microarrays for genomics, proteomics and tissue engineering. Specifically, fabrication by nanoimprint lithography (NIL), UV-NIL, step and flash imprint lithography (S-FIL), micromolding by elastomeric stamps and micro- and nano-contact printing will be reviewed.
压印光刻技术正在成为一种替代传统光刻的纳米图案化技术,它能够制造分辨率小于100纳米的二维和三维结构,可对光致抗蚀剂以外的功能材料进行图案化和改性,成本低,操作简便,适用于生物设备的开发。压印光刻技术可分为“模塑和压花”或“转移印刷”,将在基因组学、蛋白质组学和组织工程的微阵列背景下进行讨论。具体而言,将回顾纳米压印光刻(NIL)、紫外纳米压印光刻(UV-NIL)、步进闪光压印光刻(S-FIL)、弹性印章微成型以及微纳接触印刷的制造方法。