使用丙烯酰氧基全氟聚醚复合印章的软光刻技术。

Soft lithography using acryloxy perfluoropolyether composite stamps.

作者信息

Truong Tu T, Lin Rongsheng, Jeon Seokwoo, Lee Hee Hyun, Maria Joana, Gaur Anshu, Hua Feng, Meinel Ines, Rogers John A

机构信息

Department of Chemistry, Beckman Institute and Frederick Seitz Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, IL 61801, USA.

出版信息

Langmuir. 2007 Feb 27;23(5):2898-905. doi: 10.1021/la062981k. Epub 2007 Jan 30.

DOI:10.1021/la062981k

PMID:17261048

Abstract

This paper describes composite patterning elements that use a commercially available acryloxy perfluoropolyether (a-PFPE) in various soft lithographic techniques, including microcontact printing, nanotransfer printing, phase-shift optical lithography, proximity field nanopatterning, molecular scale soft nanoimprinting, and solvent assisted micromolding. The a-PFPE material, which is similar to a methacryloxy PFPE (PFPE-DMA) reported recently, offers a combination of high modulus (10.5 MPa), low surface energy (18.5 mNm(-1)), chemical inertness, and resistance to solvent induced swelling that make it useful for producing high fidelity patterns with these soft lithographic methods. The results are comparable to, and in some cases even better than, those obtained with the more widely explored material, high modulus poly(dimethylsiloxane) (h-PDMS).

摘要

本文描述了复合图案化元件，其在各种软光刻技术中使用市售的丙烯酰氧基全氟聚醚（a-PFPE），这些技术包括微接触印刷、纳米转移印刷、相移光学光刻、近场纳米图案化、分子尺度软纳米压印和溶剂辅助微成型。a-PFPE材料与最近报道的甲基丙烯酰氧基PFPE（PFPE-DMA）相似，具有高模量（10.5 MPa）、低表面能（18.5 mN m(-1)）、化学惰性以及抗溶剂诱导溶胀的特性，这些特性使其适用于通过这些软光刻方法制作高保真图案。结果与使用更广泛研究的材料——高模量聚二甲基硅氧烷（h-PDMS）所获得的结果相当，在某些情况下甚至更好。