Smallest lithographic marks generated by optical focusing systems.
作者信息
Grosjean T, Courjon D, Bainier C
机构信息
Département d'Optique P.M. Duffieux, Institut FEMTO-ST, UMR CNRS 6174, Université de Franche-Comté, Besançon Cedex, France.
出版信息
Opt Lett. 2007 Apr 15;32(8):976-8. doi: 10.1364/ol.32.000976.
PMID:17375173
Abstract
We show that the combination of Bessel beams and photosensitive materials exhibiting polarization filtering properties allows one to reach the smallest mark that can be lithographically generated by focusing systems. This property is of interest in current optical data storage techniques.
摘要
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