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双金属Mo₂掺杂的Sin(n = 9 - 16)团簇的几何结构、稳定性和生长模式:密度泛函研究

Geometries, stabilities, and growth patterns of the bimetal Mo2-doped Sin (n=9-16) clusters: a density functional investigation.

作者信息

Han Ju-Guang, Zhao Run-Ning, Duan Yuhua

机构信息

Department of Chemistry and Biochemistry, Montana State University, Bozeman, Montana 59717, USA.

出版信息

J Phys Chem A. 2007 Mar 22;111(11):2148-55. doi: 10.1021/jp0661903. Epub 2007 Feb 23.

DOI:10.1021/jp0661903
PMID:17388263
Abstract

The behaviors of the bimetal Mo-Mo doped cagelike silicon clusters Mo2Sin at the size of n=9-16 have been investigated systematically with the density functional approach. The growth-pattern behaviors, relative stabilities, and charge-transfer of these clusters are presented and discussed. The optimized geometries reveal that the dominant growth patterns of the bimetal Mo-Mo doped on opened cagelike silicon clusters (n=9-13) are based on pentagon prism MoSi10 and hexagonal prism MoSi12 clusters, while the Mo2 encapsulated Sin(n=14-16) frames are dominant growth behaviors for the large-sized clusters. The doped Mo2 dimer in the Sin frames is dissociated under the interactions of the Mo2 and Sin frames which are examined in term of the calculated Mo-Mo distance. The calculated fragmentation energies manifest that the remarkable local maximums of stable clusters are Mo2-doped Sin with n=10 and 12; the obtained relative stabilities exhibit that the Mo2-doped Si10 cluster is the most stable species in all different sized clusters. Natural population analysis shows that the charge-transfer phenomena appearing in the Mo2-doped Sin clusters are analogous to the single transition metal Re or W doped silicon clusters. In addition, the properties of frontier orbitals of Mo2-doped Sin (n=10 and 12) clusters show that the Mo2Si10 and Mo2Si12 isomers have enhanced chemical stabilities because of their larger HOMO-LUMO gaps. Interestingly, the geometry of the most stable Mo2Si9 cluster has the framework which is analogous to that of Ni2Ge9 cluster confirmed by recent experimental observation (Goicoechea, J. M.; Sevov, S. C. J. Am Chem. Soc. 2006, 128, 4155).

摘要

采用密度泛函方法系统研究了双金属Mo-Mo掺杂笼状硅簇Mo₂Siₙ(n = 9 - 16)的行为。给出并讨论了这些簇的生长模式行为、相对稳定性和电荷转移。优化后的几何结构表明,双金属Mo-Mo掺杂在开放笼状硅簇(n = 9 - 13)上的主要生长模式基于五角棱柱MoSi₁₀和六角棱柱MoSi₁₂簇,而Mo₂封装的Siₙ(n = 14 - 16)框架是大尺寸簇的主要生长行为。根据计算得到的Mo-Mo距离,研究了Mo₂和Siₙ框架相互作用下Sin框架中掺杂的Mo₂二聚体的解离情况。计算得到的裂解能表明,稳定簇的显著局部最大值是n = 10和12的Mo₂掺杂Siₙ;得到的相对稳定性表明,Mo₂掺杂的Si₁₀簇是所有不同尺寸簇中最稳定的物种。自然布居分析表明,Mo₂掺杂Siₙ簇中出现的电荷转移现象与单过渡金属Re或W掺杂的硅簇类似。此外,Mo₂掺杂Siₙ(n = 10和12)簇的前线轨道性质表明,Mo₂Si₁₀和Mo₂Si₁₂异构体由于其较大的HOMO-LUMO能隙而具有增强的化学稳定性。有趣的是,最稳定的Mo₂Si₉簇的几何结构与最近实验观察证实的Ni₂Ge₉簇的结构类似(戈伊科埃切亚,J. M.;塞沃夫,S. C.《美国化学会志》200年,128,4155)。

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