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多晶金上酞菁铜薄膜中高度取向分子的埋藏界面层。

Buried interfacial layer of highly oriented molecules in copper phthalocyanine thin films on polycrystalline gold.

作者信息

Biswas Indro, Peisert Heiko, Nagel Mathias, Casu Maria Benedetta, Schuppler Stefan, Nagel Peter, Pellegrin Eric, Chassé Thomas

机构信息

Institut für Physikalische und Theoretische Chemie, Universität Tübingen, Auf der Morgenstelle 8, 72076 Tübingen, Germany.

出版信息

J Chem Phys. 2007 May 7;126(17):174704. doi: 10.1063/1.2727476.

DOI:10.1063/1.2727476
PMID:17492876
Abstract

The growth of copper phthalocyanine thin films evaporated on polycrystalline gold is examined in detail using near edge x-ray absorption fine structure spectroscopy and surface sensitive x-ray photoemission spectroscopy. The combination of both methods allows distinguishing between the uppermost layers and buried interface layers in films up to approximately 3 nm thickness. An interfacial layer of approximately 3 ML of molecules with an orientation parallel to the substrate surface was found, whereas the subsequent molecules are perpendicular to the metal surface. It was shown that even if the preferred molecular orientation in thin films is perpendicular, the buried interfacial layer can be oriented differently.

摘要

利用近边X射线吸收精细结构光谱和表面灵敏X射线光电子能谱,详细研究了在多晶金上蒸发的铜酞菁薄膜的生长情况。这两种方法的结合能够区分厚度达约3 nm的薄膜中的最上层和埋藏的界面层。发现了一个约3个分子层厚的界面层,其分子取向与衬底表面平行,而后续分子则垂直于金属表面。结果表明,即使薄膜中分子的优选取向是垂直的,埋藏的界面层也可以有不同的取向。

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