Shen Wei, He Hongping, Zhu Jianxi, Yuan Peng, Frost Ray L
Guangzhou Institute of Geochemistry, Chinese Academy of Sciences, Guangzhou 510640, China.
J Colloid Interface Sci. 2007 Sep 1;313(1):268-73. doi: 10.1016/j.jcis.2007.04.029. Epub 2007 Apr 20.
Silane grafted montmorillonites were synthesized by using 3-aminopropyltriethoxysilane and trimethylchlorosilane via two different grafting reaction systems: (a) ethanol-water mixture and (b) vapor of silane. The resulting products were investigated using Fourier transform infrared (FTIR), X-ray diffraction (XRD), thermogravimetric analysis (TGA). XRD patterns demonstrate that silane was intercalated into the montmorillonite gallery, as indicated by the increase of the basal spacing. The product prepared by vapor deposition has a larger basal spacing than that obtained from solution, due to the different extent of silane hydrolysis in various grafting systems. TGA curves indicate that the methyl groups penetrate into the siloxane clay are the primary reason for the decrease of the dehydroxylation temperature of the grafted products. 3-Aminopropyltriethoxysilane in the grafted montmorillonite adopts a bilayer arrangement while trimethylchlorosilane adopts a monolayer arrangement within the clay gallery.
通过使用3-氨丙基三乙氧基硅烷和三甲基氯硅烷,经由两种不同的接枝反应体系合成了硅烷接枝蒙脱石:(a)乙醇-水混合物和(b)硅烷蒸汽。使用傅里叶变换红外光谱(FTIR)、X射线衍射(XRD)、热重分析(TGA)对所得产物进行了研究。XRD图谱表明,硅烷插入到蒙脱石层间,这由基面间距的增加所表明。由于在各种接枝体系中硅烷水解程度不同,通过气相沉积制备的产物比从溶液中获得的产物具有更大的基面间距。TGA曲线表明,甲基渗透到硅氧烷粘土中是接枝产物脱羟基温度降低的主要原因。接枝蒙脱石中的3-氨丙基三乙氧基硅烷采用双层排列,而三甲基氯硅烷在粘土层间采用单层排列。