Hua Guanghui, Reckhow David A
Department of Civil and Environmental Engineering, University of Massachusetts, Amherst, Massachusetts 01003, USA.
Environ Sci Technol. 2007 May 1;41(9):3309-15. doi: 10.1021/es062178c.
Natural organic matter (NOM) from five water sources was fractionated using XAD resins and ultrafiltration membranes into different groups based on hydrophobicity and molecular weight (MW), respectively. The disinfection byproduct formation from each fraction during chlorination and chloramination was studied. In tests using chlorination, hydrophobic and high MW (e.g., >0.5 kDa) precursors produced more unknown total organic halogen (UTOX) than corresponding hydrophilic and low MW (e.g., <0.5 kDa) precursors. Trihaloacetic acid (THAA) precursors were more hydrophobic than trihalomethane (THM) precursors. The formation of THM and THAA was similar among different fractions for a water with low humic content. Hydrophilic and low MW (<0.5 kDa) NOM fractions gave the highest dihaloacetic acid (DHAA) yields. No significant difference was found for DHAA formation among different NOM fractions during chloramination. Increasing pH from 6 to 9 led to lower TOX formation for hydrophobic and high MW NOM fractions but had little impact on TOX yields from hydrophilic and low MW fractions. Bromine and iodine were more reactive with hydrophilic and low MW precursors as measured by THM or HAA formation than their corresponding hydrophobic and high MW precursors. However, hydrophobic and high MW precursors produced more UTOX when reacting with bromine and iodine.
使用XAD树脂和超滤膜分别根据疏水性和分子量（MW）将来自五个水源的天然有机物（NOM）分成不同的组。研究了氯化和氯胺化过程中各组分的消毒副产物形成情况。在氯化试验中，疏水性和高分子量（例如，>0.5 kDa）的前体比相应的亲水性和低分子量（例如，<0.5 kDa）的前体产生更多的未知总有机卤（UTOX）。三卤乙酸（THAA）前体比三卤甲烷（THM）前体更具疏水性。对于腐殖质含量低 的水，不同组分中THM和THAA的形成情况相似。亲水性和低分子量（<0.5 kDa）的NOM组分产生的二卤乙酸（DHAA）产率最高。氯胺化过程中不同NOM组分之间的DHAA形成没有显著差异。将pH从6提高到9会导致疏水性和高分子量NOM组分的TOX形成降低，但对亲水性和低分子量组分的TOX产率影响不大。通过THM或HAA形成测量，溴和碘与亲水性和低分子量前体的反应性比其相应的疏水性和高分子量前体更高。然而，疏水性和高分子量前体与溴和碘反应时会产生更多的UTOX。
