激发态间位效应在光不稳定保护基设计中的应用。
Application of the excited state meta effect in photolabile protecting group design.
作者信息
Wang Pengfei, Hu Huayou, Wang Yun
机构信息
Department of Chemistry, University of Alabama at Birmingham, Birmingham, Alabama 35294, USA.
出版信息
Org Lett. 2007 Jul 19;9(15):2831-3. doi: 10.1021/ol071085c. Epub 2007 Jun 20.
PMID:17580889
Abstract
A novel photolabile protecting group for carbonyl compounds has been developed, based on the excited state meta effect.
摘要
基于激发态间位效应，已开发出一种用于羰基化合物的新型光不稳定保护基。
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