用于羰基化合物的新型光不稳定保护基团。

Novel photolabile protecting group for carbonyl compounds.

作者信息

Wang Pengfei, Hu Huayou, Wang Yun

机构信息

Department of Chemistry, University of Alabama at Birmingham, Birmingham, Alabama 35294, USA.

出版信息

Org Lett. 2007 Apr 12;9(8):1533-5. doi: 10.1021/ol070346f. Epub 2007 Mar 20.

DOI:10.1021/ol070346f

PMID:17371037

Abstract

[reaction: see text] A novel type of photo-protecting group for carbonyl compounds is described. The protecting group is readily accessed in one step from commercially available material. Installation of the protecting group upon the carbonyl compounds is achieved in excellent yields. The carbonyl compounds in their protected form are remarkably stable under various conditions and can be released photochemically in high efficiency.

摘要

[反应：见正文] 描述了一种新型的羰基化合物光保护基团。该保护基团可通过一步反应从市售原料轻松获得。羰基化合物上保护基团的引入产率优异。其受保护形式的羰基化合物在各种条件下都非常稳定，并且可以通过光化学方法高效释放。