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纳米/微米级颗粒在去离子水和化学镀镍溶液中的稳定性。

Stability of nano-/microsized particles in deionized water and electroless nickel solutions.

作者信息

Necula B S, Apachitei I, Fratila-Apachitei L E, Teodosiu C, Duszczyk J

机构信息

Delft University of Technology, Department of Materials Science and Engineering, Mekelweg 2, 2628 CD Delft, The Netherlands.

出版信息

J Colloid Interface Sci. 2007 Oct 15;314(2):514-22. doi: 10.1016/j.jcis.2007.05.073. Epub 2007 Jul 12.

Abstract

A major problem in the co-deposition of nano- and microsized particles within electroless NiP coatings is particle dispersion in the electroless nickel solution because of the strong tendency of particles toward agglomeration and sedimentation. The stability of colloidal Al(2)O(3), CeO(2), and BN particles and Al(2)O(3)CeO(2) and Al(2)O(3)BN particle mixtures in deionized water and electroless nickel solution was investigated by zeta potential measurements and sedimentation tests. Dispersions of Al(2)O(3) and CeO(2) particles showed good stability in deionized water with zeta potential values of 55 and 39 mV, respectively. BN dispersion in deionized water was found to be relatively unstable at pH 4 with zeta potential values of -13 mV, but at higher pH (i.e., pH 5.5), the values decreased up to about -40 mV. When the dispersions were made in electroless nickel solution, a significant decrease of the zeta potential values was observed for both single particles and mixtures of particles, indicating a change in the surface charge from high positive to low negative with detrimental effects on dispersion stability. Further, the findings suggested that the stability of particle mixtures is dominated by one type of particle, i.e., the Al(2)O(3)CeO(2) dispersion is governed by the single CeO(2) particles, whereas the Al(2)O(3)BN dispersion is governed by the Al(2)O(3) particles. All the zeta potential measurements were in line with the results of the sedimentation tests (i.e., low zeta potential values corresponded to short settling times, whereas high zeta potential values corresponded to long settling times).

摘要

在化学镀NiP涂层中,纳米和微米级颗粒共沉积的一个主要问题是颗粒在化学镀镍溶液中的分散,因为颗粒具有很强的团聚和沉降趋势。通过zeta电位测量和沉降试验研究了胶体Al(2)O(3)、CeO(2)和BN颗粒以及Al(2)O(3)CeO(2)和Al(2)O(3)BN颗粒混合物在去离子水和化学镀镍溶液中的稳定性。Al(2)O(3)和CeO(2)颗粒在去离子水中的分散表现出良好的稳定性,zeta电位值分别为55和39 mV。发现BN在去离子水中于pH 4时的分散相对不稳定,zeta电位值为-13 mV,但在较高pH(即pH 5.5)时,该值降至约-40 mV。当在化学镀镍溶液中制备分散体时,观察到单颗粒和颗粒混合物的zeta电位值均显著降低,表明表面电荷从高正值变为低负值,对分散稳定性产生不利影响。此外,研究结果表明颗粒混合物的稳定性由一种类型的颗粒主导,即Al(2)O(3)CeO(2)分散体由单一的CeO(2)颗粒控制,而Al(2)O(3)BN分散体由Al(2)O(3)颗粒控制。所有的zeta电位测量结果都与沉降试验结果一致(即低zeta电位值对应短沉降时间,而高zeta电位值对应长沉降时间)。

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