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硅-氧键的高压晶体化学:对地球地幔矿物学的启示。

Crystal Chemistry of Silicon--Oxygen Bonds at High Pressure: Implications for the Earth's Mantle Mineralogy.

出版信息

Science. 1978 Sep 22;201(4361):1122-3. doi: 10.1126/science.201.4361.1122.

Abstract

Transformations involving a change from tetrahedrally coordinated to octahedrally coordinated silicon ((IV)Si --> (VI)Si) are observed to occur at high pressure when the mean (IV)Si-O bond compresses to approximately 1.59 angstroms based on known room-pressure crystal structures, Si-O bond compressibilities, and pressures of (IV)Si --> (VI)Si transformations. The lower two-thirds of the mantle transition zone of high-density gradient (500 to 900 kilometers) corresponds to the predicted range of (IV)Si --> (VI)Si transformations. The 10 percent density increase of this zone at zero pressure is attributed primarily to the density increase associated with the change in silicon coordination. Below 900 kilometers all silicon is predicted to be in octahedral or greater coordination. The concept of cation polyhedral stability fields is defined.

摘要

当平均(IV)Si-O 键压缩到约 1.59 埃时,四面体配位到八面体配位的硅((IV)Si-->(VI)Si)的转变在高压下发生,这种转变基于已知的室温晶体结构、Si-O 键压缩率和(IV)Si-->(VI)Si 转变的压力。高密度梯度(500 至 900 公里)地幔过渡带的下三分之二对应于(IV)Si-->(VI)Si 转变的预测范围。该区域在零压力下的 10%密度增加主要归因于与硅配位变化相关的密度增加。在 900 公里以下,所有的硅都预计处于八面体或更大的配位状态。阳离子多面体稳定场的概念被定义。

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