van Loo Karen M J, Martens Gerard J M
Department of Molecular Animal Physiology, Nijmegen Center for Molecular Life Sciences (NCMLS) & Institute for Neuroscience, Faculty of Science, Radboud University Nijmegen, 282 RT, Geert Grooteplein Zuid 28, Nijmegen, 6525 GA, The Netherlands.
Behav Genet. 2007 Sep;37(5):697-705. doi: 10.1007/s10519-007-9164-1.
A combination of genetic variations, epimutations and environmental factors may be involved in the etiology of complex neurodevelopmental disorders like schizophrenia. To study such disorders, we use apomorphine-unsusceptible (APO-UNSUS) Wistar rats and their phenotypic counterpart apomorphine-susceptible (APO-SUS) rats that display a complex phenotype remarkably similar to that of schizophrenic patients. As the molecular basis of the APO-SUS/UNSUS rat model, we recently identified a genomic rearrangement of the Aph-1b gene. Here, we discovered between the two rat lines differences other than the Aph-1b gene defect, including a remarkable cluster of genetic variations, two variants corresponding to topoisomerase II-based recombination hot spots and an epigenetic (DNA methylation) difference in cerebellum and (hypo)thalamic but not hippocampal genomic DNA. Furthermore, genetic variations were found to correlate with the degree of apomorphine susceptibility in unselected Wistar rats. Together, the results show that a number of genetic and epigenetic differences exist between the APO-SUS and -UNSUS rat genomes, raising the possibility that in addition to the Aph-1b gene defect the newly identified variations may also contribute to the complex APO-SUS phenotype.
基因变异、表观突变和环境因素的综合作用可能与精神分裂症等复杂神经发育障碍的病因有关。为了研究此类疾病,我们使用了对阿扑吗啡不敏感(APO-UNSUS)的Wistar大鼠及其表型对应物对阿扑吗啡敏感(APO-SUS)的大鼠,后者表现出与精神分裂症患者极为相似的复杂表型。作为APO-SUS/UNSUS大鼠模型的分子基础,我们最近鉴定出Aph-1b基因的基因组重排。在此,我们发现这两种大鼠品系之间除了Aph-1b基因缺陷外还存在其他差异,包括显著的基因变异簇、两个与基于拓扑异构酶II的重组热点相对应的变体,以及小脑和下丘脑而非海马体基因组DNA中的表观遗传(DNA甲基化)差异。此外,在未经过选择的Wistar大鼠中发现基因变异与阿扑吗啡敏感性程度相关。总之,结果表明APO-SUS和APO-UNSUS大鼠基因组之间存在许多遗传和表观遗传差异,这增加了一种可能性,即除了Aph-1b基因缺陷外,新发现的变异也可能导致复杂的APO-SUS表型。