Li Yongxin, Maire Helene C, Ito Takashi
Department of Chemistry, Kansas State University, Manhattan, KS 66506, USA.
Langmuir. 2007 Dec 4;23(25):12771-6. doi: 10.1021/la702756s. Epub 2007 Nov 1.
Cyclic voltammetry (CV) was used to assess fabrication of a nanoporous film from a polystyrene-poly(methyl methacrylate) diblock copolymer (PS-b-PMMA) and also to explore the surface functional groups on the resulting nanopores. Polymer films containing vertically aligned cylindrical nanoscale pores (ca. 10 nm in pore radius, 20-30 nm in film thickness) were prepared on gold substrates by removing the cylindrical PMMA domains from PS-b-PMMA films via UV irradiation and subsequent acetic acid treatment. CV measurements provided a simple means for monitoring the extent of the removal of the PMMA domains and for assessing the formation of a recessed nanodisk-array electrode (RNE) structure. The resulting RNEs exhibited a decrease in redox current of anionic Fe(CN)6(3-) with increasing solution pH from 4.6 to 6.3 and a negligible change in CV of uncharged 1,1'-ferrocenedimethanol. The decrease in redox current of Fe(CN)6(3-) at the higher pH was due to electrostatic repulsion between Fe(CN)6(3-) and the electrical double layer formed in the neighborhood of the negatively charged nanopore surface. Indeed, the reduction of effective pore radius measured from CVs of Fe(CN)6(3-) was correlated to the change in the thickness of the electrical double layer. The pH range that showed the decrease in redox current of Fe(CN)6(3-) was consistent with the presence of -COOH groups on the nanopore surface, although they were not detected using Fourier transform infrared spectra of etched PS-b-PMMA films.
循环伏安法(CV)用于评估由聚苯乙烯-聚(甲基丙烯酸甲酯)二嵌段共聚物(PS-b-PMMA)制备纳米多孔膜的过程,并探究所得纳米孔上的表面官能团。通过紫外线照射和随后的乙酸处理,从PS-b-PMMA膜中去除圆柱形的PMMA域,从而在金基底上制备出含有垂直排列的圆柱形纳米级孔(孔径约10 nm,膜厚度为20 - 30 nm)的聚合物膜。CV测量提供了一种简单的方法,用于监测PMMA域的去除程度以及评估凹陷纳米盘阵列电极(RNE)结构的形成。所得的RNE显示,随着溶液pH从4.6增加到6.3,阴离子型Fe(CN)6(3-)的氧化还原电流降低,而不带电荷的1,1'-二茂铁二甲醇的CV变化可忽略不计。在较高pH下Fe(CN)6(3-)氧化还原电流的降低是由于Fe(CN)6(3-)与带负电荷的纳米孔表面附近形成的双电层之间的静电排斥。实际上,从Fe(CN)6(3-)的CV测量中得出的有效孔径的减小与双电层厚度的变化相关。尽管在蚀刻后的PS-b-PMMA膜的傅里叶变换红外光谱中未检测到纳米孔表面存在-COOH基团,但显示Fe(CN)6(3-)氧化还原电流降低的pH范围与纳米孔表面存在-COOH基团是一致的。