Roucoules V, Ponche A, Geissler A, Siffer F, Vidal L, Ollivier S, Vallat M F, Marie P, Voegel J C, Schaaf P, Hemmerlé J
Institut de Chimie des Surfaces et Interfaces, I.C.S.I., C.N.R.S., UPR 9069, 15, Rue Jean Starcky, 68057 Mulhouse Cedex, France.
Langmuir. 2007 Dec 18;23(26):13136-45. doi: 10.1021/la701460f. Epub 2007 Nov 14.
Poly(dimethylsiloxane) (PDMS) substrates are used in many applications where the substrates need to be elongated and various treatments are used to regulate their surface properties. In this article, we compare the effect of three of such treatments, namely, UV irradiation, water plasma, and plasma polymerization, both from a molecular and from a macroscopic point of view. We focus our attention in particular on the behavior of the treated surfaces under mechanical stretching. UV irradiation induces the substitution of methyl groups by hydroxyl and acid groups, water plasma leads to a silicate-like layer, and plasma polymerization causes the formation of an organic thin film with a major content of anhydride and acid groups. Stretching induces cracks on the surface both for silicate-like layers and for plasma polymer thin coatings. This is not the case for the UV irradiated PDMS substrates. We then analyzed the chemical composition of these cracks. In the case of water plasma, the cracks reveal native PDMS. In the case of plasma polymerization, the cracks reveal modified PDMS. The contact angles of plasma polymer and UV treated surfaces vary only very slightly under stretching, whereas large variations are observed for water plasma treatments. The small variation in the contact angle values observed on the plasma polymer thin film under stretching even when cracks appear on the surface are explained by the specific chemistry of the PDMS in the cracks. We find that it is very different from native PDMS and that its structure is somewhere between Si(O2) and Si(O3). This is, to our knowledge, the first study where different surface treatments of PDMS are compared for films under stretching.
聚二甲基硅氧烷(PDMS)基材被用于许多需要对基材进行拉伸且采用各种处理来调节其表面性质的应用中。在本文中,我们从分子和宏观两个角度比较了三种此类处理方法的效果,即紫外线照射、水等离子体处理和等离子体聚合。我们特别关注经处理的表面在机械拉伸下的行为。紫外线照射会导致甲基被羟基和酸基取代,水等离子体处理会形成类似硅酸盐的层,而等离子体聚合会导致形成主要含有酸酐和酸基的有机薄膜。拉伸会在类似硅酸盐的层和等离子体聚合物薄涂层的表面引发裂纹。紫外线照射的PDMS基材则不会出现这种情况。然后我们分析了这些裂纹的化学成分。对于水等离子体处理的情况,裂纹显示出原始的PDMS。对于等离子体聚合的情况,裂纹显示出改性的PDMS。等离子体聚合物和紫外线处理过的表面在拉伸下接触角变化非常小,而水等离子体处理则观察到较大的变化。即使表面出现裂纹,在拉伸下等离子体聚合物薄膜上观察到的接触角值的微小变化是由裂纹中PDMS的特定化学性质所解释的。我们发现它与原始的PDMS非常不同,其结构介于Si(O2)和Si(O3)之间。据我们所知,这是第一项比较PDMS在拉伸下不同表面处理对薄膜影响的研究。