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通过价电子能量损失谱研究纳米材料的电子结构——以掺杂氧化锌纳米线为例。

Nanomaterial electronic structure investigation by valence electron energy loss spectroscopy - an example of doped ZnO nanowires.

作者信息

Wang Juan, Li Quan, Ronning C, Stichtenoth D, Müller S, Tang D

机构信息

Department of Physics, The Chinese University of Hong Kong, Shatin, New Territory, Hong Kong.

出版信息

Micron. 2008 Aug;39(6):703-8. doi: 10.1016/j.micron.2007.10.015. Epub 2007 Oct 22.

Abstract

The effects of doping (by ion implantation) on the electronic structure of ZnO nanowires, particularly on the defect states generation in the band gap of ZnO, are investigated using valence electron energy loss spectroscopy (VEELS) performed in a transmission electron microscope (TEM). The improved spectrum energy resolution via the introduction of a gun monochromator, together with the reduced intensity in the zero loss peak tail as realized by spectrum acquisition at non-zero momentum transfer, enable us to extract such electronic structure information from the very low loss region of the EEL spectra. We have compared the doping effects of several dopant elements, i.e., Er, Yb, and Co, and found that generation of the band tail states ( approximately 2-3.3eV) is a common consequence of the ion implantation process. On the other hand, specific mid-gap state(s) in the lower energy range are created only in the rare earth element doped ZnO nanowires, suggesting the dopant-sensitive nature of such state.

摘要

利用在透射电子显微镜(TEM)中进行的价电子能量损失谱(VEELS),研究了(通过离子注入)掺杂对ZnO纳米线电子结构的影响,特别是对ZnO带隙中缺陷态产生的影响。通过引入枪式单色仪提高了谱能量分辨率,以及通过在非零动量转移下进行谱采集实现了零损失峰尾部强度的降低,使我们能够从EEL谱的极低损失区域提取此类电子结构信息。我们比较了几种掺杂元素(即Er、Yb和Co)的掺杂效果,发现带尾态(约2 - 3.3eV)的产生是离子注入过程的常见结果。另一方面,仅在稀土元素掺杂的ZnO纳米线中产生了较低能量范围内的特定中间能隙态,表明此类态对掺杂剂敏感的性质。

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