基底处理对通过朗缪尔-布洛杰特转移实现的自组织图案形成的影响。

Influence of substrate treatment on self-organized pattern formation by langmuir-blodgett transfer.

作者信息

Hirtz Michael, Fuchs Harald, Chi Lifeng

机构信息

Physikalisches Institut, Westfälische Wilhelms-Universität, Wilhelm-Klemm-Strasse 10, 48149 Münster, Germany.

出版信息

J Phys Chem B. 2008 Jan 24;112(3):824-7. doi: 10.1021/jp0767664. Epub 2007 Dec 22.

DOI:10.1021/jp0767664

PMID:18154286

Abstract

Mesoscopic stripe patterns can be obtained by Langmuir-Blodgett (LB) transfer of l-alpha-dipalmitoylphosphatidylcholine (DPPC) onto solid substrates. In order to investigate the influence of substrates on the pattern formation, silicon slides treated by different cleaning processes were taken as model systems. A shift in the transfer pressure range for patterning was observed between plasma- and RCA-treated silicon. This can be explained with a model of equivalent states and taking into account the influence of microscale water films on the substrates.

摘要

通过将 l-α-二棕榈酰磷脂酰胆碱（DPPC）进行朗缪尔-布洛杰特（LB）转移到固体基板上，可以获得介观条纹图案。为了研究基板对图案形成的影响，将经过不同清洗工艺处理的硅片作为模型系统。在等离子体处理和 RCA 处理的硅之间观察到图案化转移压力范围的偏移。这可以用等效状态模型并考虑基板上微尺度水膜的影响来解释。