Jradi S, Soppera O, Lougnot D J
Département de Photochimie Générale, CNRS UMR 7525, ENSC Mu, 3 rue A Werner, 68093, Mulhouse Cedex, France.
J Microsc. 2008 Jan;229(Pt 1):151-61. doi: 10.1111/j.1365-2818.2007.01878.x.
This paper highlights the potential of atomic force microscopy in the pulsed force mode to investigate the photopatterning of acrylic-based films. The pulsed force mode is a nonresonant mode designed to allow approach curves to be recorded along the scanning path. It thereby provides the topography of the sample and a direct and simple local characterization of adhesion and stiffness. This mode can be used either for imaging or for locally probing the mechanical properties of a surface. In particular, a correlation between stiffness and conversion of the monomer was established. The close examination of the pulsed force mode signal brought accurate information on the photoinduced modification of the film. Polymer films with submicron photopatterning generated by interferometric illumination were analyzed by pulsed force mode. It was established that the gradient of mechanical properties throughout the films was strongly dependant on the irradiation conditions.
本文重点介绍了原子力显微镜在脉冲力模式下研究丙烯酸基薄膜光图案化的潜力。脉冲力模式是一种非共振模式，旨在允许沿扫描路径记录接近曲线。由此可提供样品的形貌以及对粘附力和刚度的直接、简单的局部表征。该模式可用于成像或局部探测表面的机械性能。特别是，建立了刚度与单体转化率之间的相关性。对脉冲力模式信号的仔细检查带来了有关薄膜光致改性的准确信息。通过脉冲力模式分析了由干涉照明产生的具有亚微米光图案化的聚合物薄膜。结果表明，整个薄膜的机械性能梯度强烈依赖于辐照条件。
