Singh L P, Murthy S S N, Bräuniger T, Zimmermann H
School of Physical Sciences, Jawaharlal Nehru University, New Delhi, India.
J Phys Chem B. 2008 Feb 14;112(6):1594-603. doi: 10.1021/jp077023l. Epub 2008 Jan 23.
We have examined the relaxation that occurs in the supercooled plastic crystalline phases of pentachloronitrobenzene (PCNB), dichlorotetramethylbenzene (DCTMB), trichlorotrimethylbenzene (TCTMB) along with some of their deuterated samples, and 1-cyanoadamantane (CNADM) in the presence of intentionally added dopants. The experimental techniques used in the present study are dielectric spectroscopy and differential scanning calorimetry (DSC). Only one relaxation process similar to that of the primary (or alpha-) relaxation characteristic of glass-forming materials is found, but there is no indication of any observable secondary relaxation within the resolution of our experimental setup. The alpha-process can reasonably be described by a Havriliak-Negami (HN) shape function throughout the frequency range. However, in the case of PCNB the dielectric strength (Delta epsilon) of the above said alpha-process does not change appreciably with temperature, though interestingly, a small addition of a dopant such as pentachlorobenzene (PCB), trichlorobenzene (TCB), and chloroadamantane (CLADM) to the molten state of PCNB drastically lowers the dielectric strength by a factor of 4 to 8. Powder X-ray diffraction measurements at room temperature and DSC data do not indicate any appreciable change in the crystalline structure. It is noticed that the effect of PCB as a dopant on the magnitude of alpha-process of CNADM is moderate, whereas both PCB and TCB as dopants show a much reduced effect on the relaxation in DCTMB and TCTMB. It is suggested that the drastic changes in the dielectric strength of the alpha-process is due to the rotational hindrance caused by the presence of a small number of dopant molecules in the host crystalline lattice. In the above context, the possibility of a certain degree of antiparallel ordering of dipoles is also discussed.
我们研究了五氯硝基苯(PCNB)、二氯四甲基苯(DCTMB)、三氯三甲基苯(TCTMB)及其一些氘代样品以及1-氰基金刚烷(CNADM)在故意添加掺杂剂的情况下,在过冷塑性晶相中的弛豫情况。本研究中使用的实验技术是介电谱和差示扫描量热法(DSC)。只发现了一个类似于玻璃形成材料的初级(或α-)弛豫的弛豫过程,但在我们实验装置的分辨率范围内没有任何可观察到的次级弛豫的迹象。在整个频率范围内,α过程可以合理地用哈夫里利亚克-内加米(HN)形状函数来描述。然而,在PCNB的情况下,上述α过程的介电强度(Δε)随温度变化不明显,不过有趣的是,向PCNB的熔融态中少量添加五氯苯(PCB)、三氯苯(TCB)和氯基金刚烷(CLADM)等掺杂剂会使介电强度急剧降低4至8倍。室温下的粉末X射线衍射测量和DSC数据表明晶体结构没有明显变化。注意到PCB作为掺杂剂对CNADM的α过程幅度的影响适中,而PCB和TCB作为掺杂剂对DCTMB和TCTMB中的弛豫的影响则小得多。有人认为,α过程介电强度的急剧变化是由于主体晶格中少量掺杂剂分子的存在引起的旋转位阻。在上述背景下,还讨论了偶极子一定程度反平行排列的可能性。