Stefanopoulos Vassileios G, Papadimitriou Vassileios C, Lazarou Yannis G, Papagiannakopoulos Panos
Laboratory of Photochemistry and Kinetics, Department of Chemistry, University of Crete, Heraklion 710 03, Crete, Greece.
J Phys Chem A. 2008 Feb 21;112(7):1526-35. doi: 10.1021/jp7096789. Epub 2008 Jan 26.
The gas-phase reaction of atomic chlorine with diiodomethane was studied over the temperature range 273-363 K with the very low-pressure reactor (VLPR) technique. The reaction takes place in a Knudsen reactor at pressures below 3 mTorr, where the steady-state concentration of both reactants and stable products is continuously measured by electron-impact mass spectrometry. The absolute rate coefficient as a function of temperature was given by k = (4.70 +/- 0.65) x 10-11 exp[-(241 +/- 33)/T] cm3molecule-1s-1, in the low-pressure regime. The quoted uncertainties are given at a 95% level of confidence (2sigma) and include systematic errors. The reaction occurs via two pathways: the abstraction of a hydrogen atom leading to HCl and the abstraction of an iodine atom leading to ICl. The HCl yield was measured to be ca. 55 +/- 10%. The results suggest that the reaction proceeds via the intermediate CH2I2-Cl adduct formation, with a I-Cl bond strength of 51.9 +/- 15 kJ mol-1, calculated at the B3P86/aug-cc-pVTZ-PP level of theory. Furthermore, the oxidation reactions of CHI2 and CH2I radicals were studied by introducing an excess of molecular oxygen in the Knudsen reactor. HCHO and HCOOH were the primary oxidation products indicating that the reactions with O2 proceed via the intermediate peroxy radical formation and the subsequent elimination of either IO radical or I atom. HCHO and HCOOH were also detected by FT-IR, as the reaction products of photolytically generated CH2I radicals with O2 in a static cell, which supports the proposed oxidation mechanism. Since the photolysis of CH2I2 is about 3 orders of magnitude faster than its reactive loss by Cl atoms, the title reaction does not constitute an important tropospheric sink for CH2I2.
采用极低压力反应器(VLPR)技术,在273 - 363 K的温度范围内研究了原子氯与二碘甲烷的气相反应。该反应在压力低于3 mTorr的克努森反应器中进行,通过电子轰击质谱法连续测量反应物和稳定产物的稳态浓度。在低压条件下,绝对速率系数与温度的函数关系为k = (4.70 ± 0.65) x 10⁻¹¹ exp[-(241 ± 33)/T] cm³·分子⁻¹·s⁻¹。所引用的不确定度是在95%置信水平(2σ)下给出的,包括系统误差。该反应通过两条途径进行:氢原子的夺取导致生成HCl,碘原子的夺取导致生成ICl。测得HCl产率约为55 ± 10%。结果表明,该反应通过中间体CH₂I₂ - Cl加合物的形成进行,在B3P86/aug - cc - pVTZ - PP理论水平下计算得出I - Cl键强度为51.9 ± 15 kJ·mol⁻¹。此外,通过在克努森反应器中引入过量的分子氧,研究了CHI₂和CH₂I自由基的氧化反应。HCHO和HCOOH是主要的氧化产物,表明与O₂的反应通过中间体过氧自由基的形成以及随后IO自由基或I原子的消除进行。在静态池中,光解产生的CH₂I自由基与O₂的反应产物也通过傅里叶变换红外光谱(FT - IR)检测到了HCHO和HCOOH,这支持了所提出的氧化机理。由于CH₂I₂的光解比其被Cl原子的反应性损失快约3个数量级,因此该标题反应并非对流层中CH₂I₂的重要汇。