Vargas W E, Niklasson G A
Appl Opt. 1997 Aug 1;36(22):5580-6. doi: 10.1364/ao.36.005580.
The description of optical properties of light-scattering materials has made extensive use of radiative transfer models. One of the most successful and simplest models is that of Kubelka and Munk (KM). With this model, optical properties of particulate films under diffuse illumination can be predicted from effective absorption and scattering coefficients of the material. We consider the applicability conditions of this kind of model. An extended KM model for the case of perpendicular collimated illumination is compared with results from a more general four-flux approach, and the differences between them are characterized in terms of a correction factor that depends on particle scattering and absorption, concentration of the scatterers, and film thickness. It is proved formally that the extended KM model under perpendicular illumination is a good approximation for the cases of optically thick films that contain weakly or nonabsorbing particles.
光散射材料光学特性的描述广泛使用了辐射传输模型。最成功且最简单的模型之一是库贝尔卡-蒙克(KM)模型。利用该模型,可根据材料的有效吸收系数和散射系数预测漫射照明下颗粒薄膜的光学特性。我们考虑这类模型的适用条件。将垂直准直照明情况下的扩展KM模型与更通用的四流方法的结果进行比较,并根据一个取决于粒子散射和吸收、散射体浓度以及薄膜厚度的校正因子来表征它们之间的差异。正式证明了垂直照明下的扩展KM模型对于包含弱吸收或非吸收粒子的光学厚膜情况是一个很好的近似。