Sriram S, Bhaskaran M, Short K T, Matthews G I, Holland A S
Microelectronics and Materials Technology Centre, School of Electrical and Computer Engineering, RMIT University, GPO Box 2476V, Melbourne, Victoria 3001, Australia.
Micron. 2009 Jan;40(1):109-13. doi: 10.1016/j.micron.2008.01.007. Epub 2008 Jan 20.
This article introduces a technique for observing and quantifying the piezoelectric response of thin films, using standard atomic force microscopes (AFMs). The technique has been developed and verified using strontium-doped lead zirconate titanate (PSZT) thin films, which are known for their high piezoelectric response. Quantification of the electro-mechanical voltage coefficient d(33) (pm/V) is made directly based on the applied peak-to-peak voltage and the corresponding peak-to-peak displacement in the obtained scan image. Under the proposed technique the AFM is configured in contact mode, where the silicon nitride tip is set to follow the film displacement at a single point. A known sinusoidal voltage is applied across the film and the displacement determined as a function of time, rather than the typical AFM measurement of displacement versus tip position. The resulting raster image contains several bands, which are directly related to the AFM scan frequency and the applied sinusoidal voltage and its frequency. Different combinations of the AFM scan frequency and the applied sinusoid frequency have been used to characterise the PSZT thin films, with estimated values of d(33) between 109 and 205 pm/V.
本文介绍了一种使用标准原子力显微镜(AFM)观察和量化薄膜压电响应的技术。该技术已通过掺锶锆钛酸铅(PSZT)薄膜进行开发和验证,PSZT薄膜以其高压电响应而闻名。机电电压系数d(33)(皮米/伏)的量化是直接基于所施加的峰峰值电压以及在获得的扫描图像中相应的峰峰值位移。在所提出的技术中,AFM配置为接触模式,其中氮化硅尖端设置为在单个点跟随薄膜位移。在薄膜上施加已知的正弦电压,并确定位移随时间的函数,而不是典型的AFM位移与尖端位置的测量。所得的光栅图像包含几个条带,它们与AFM扫描频率、所施加的正弦电压及其频率直接相关。已使用AFM扫描频率和所施加的正弦频率的不同组合来表征PSZT薄膜,d(33)的估计值在109至205皮米/伏之间。