Helmecke Olaf, Hirsch Alexander, Behrens Peter, Menzel Henning
Institute of Technical Chemistry, Braunschweig University of Technology, Hans-Sommer-Str. 10, 38106 Braunschweig, Germany.
J Colloid Interface Sci. 2008 May 1;321(1):44-51. doi: 10.1016/j.jcis.2008.01.006. Epub 2008 Mar 4.
Microstructured polymer films prepared by photochemical grafting of different polymers were used as restricted reaction areas in silica deposition experiments. Linear and branched poly(alkyleneimines) and poly(allylamine hydrochloride) in pure aqueous or phosphate-containing solutions were used as additives to silica precursor solutions. The silica deposits obtained by spin-coating these solutions onto microstructured polymer films were investigated by scanning electron microscopy and atomic force microscopy. Experiments with poly(alkylene imines) in the silica precursor solution show the deposition of smooth and granular silica structures that closely mimic the natural patterns. The structure formation can be explained by physicochemical processes. Hypotheses that have been made for the natural silification processes can be evaluated on this basis.
通过光化学接枝不同聚合物制备的微结构聚合物薄膜被用作二氧化硅沉积实验中的受限反应区域。在二氧化硅前驱体溶液中,将纯水溶液或含磷酸盐溶液中的线性和支化聚(亚烷基胺)及聚(烯丙胺盐酸盐)用作添加剂。通过将这些溶液旋涂到微结构聚合物薄膜上获得的二氧化硅沉积物,用扫描电子显微镜和原子力显微镜进行了研究。在二氧化硅前驱体溶液中使用聚(亚烷基胺)的实验表明,光滑且呈颗粒状的二氧化硅结构的沉积紧密模仿了自然图案。结构形成可以通过物理化学过程来解释。在此基础上,可以评估针对天然硅化过程所提出的假设。