极紫外光学系统在波长处的系统级耀斑特性
At-wavelength, system-level flare characterization of extreme-ultraviolet optical systems.
作者信息
Naulleau P, Goldberg K A, Gullikson E M, Bokor J
机构信息
Center for X-Ray Optics, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA.
出版信息
Appl Opt. 2000 Jun 10;39(17):2941-7. doi: 10.1364/ao.39.002941.
The extreme-ultraviolet (EUV) phase-shifting point-diffraction interferometer (PS/PDI) has recently been developed to provide high-accuracy wave-front characterization critical to the development of EUV lithography systems. Here we describe an enhanced implementation of the PS/PDI that significantly extends its measurement bandwidth. The enhanced PS/PDI is capable of simultaneously characterizing both wave front and flare. PS/PDI-based flare characterization of two recently fabricated EUV 10x-reduction lithographic optical systems is presented.
极紫外（EUV）相移点衍射干涉仪（PS/PDI）最近已被开发出来，以提供对EUV光刻系统发展至关重要的高精度波前表征。在此，我们描述了PS/PDI的一种增强型实现方式，它显著扩展了其测量带宽。增强型PS/PDI能够同时表征波前和耀斑。本文展示了基于PS/PDI对两个最近制造的EUV 10倍缩小光刻光学系统的耀斑表征。
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