Yuan G H, Zhang L, Zhang Y D, Fan M W, Bian Z, Chen Z
Key Laboratory for Oral Biomedical Engineering of the Ministry of Education, School & Hospital of Stomatology, Wuhan University, Wuhan, Hubei, PR China 430079.
J Dent Res. 2008 Apr;87(4):386-90. doi: 10.1177/154405910808700412.
Between the incisor and molars in each dental quadrant, mice have a toothless gap (diastema) that may contain vestigial tooth primordia. It is still not clear whether suppression of odontogenesis in the mouse lower diastema can be attributed to epithelium, mesenchyme, or both. Therefore, using recombination experiments with mouse tissues from E11.5 and E13.5 stages, we investigated whether the epithelium or mesenchyme is responsible for the suppression of odontogenesis. Five groups of recombinants were established and cultured under mouse kidney capsules. The results demonstrated that at E11.5, the lower diastemal epithelium and mesenchyme possessed odontogenic potential and competence, respectively; at E13.5, both the lower diastemal epithelium and mesenchyme had odontogenic competence, while the lower diastemal mesenchyme did not possess odontogenic potential. On the basis of comparison of the odontogenic capabilities between the lower diastemal and molar tooth primordia, we conclude that mesenchyme is responsible for tooth regression in the mouse lower diastema.
在每个牙象限的切牙和磨牙之间,小鼠有一个无牙间隙(齿缝),其中可能包含残留的牙原基。目前尚不清楚小鼠下齿缝中牙发生的抑制是归因于上皮、间充质还是两者。因此,我们利用来自E11.5和E13.5阶段小鼠组织的重组实验,研究了上皮还是间充质对牙发生的抑制负责。建立了五组重组体并在小鼠肾被膜下培养。结果表明,在E11.5时,下齿缝上皮和间充质分别具有牙发生潜能和能力;在E13.5时,下齿缝上皮和间充质都具有牙发生能力,而下齿缝间充质不具有牙发生潜能。基于下齿缝和磨牙牙原基之间牙发生能力的比较,我们得出结论,间充质对小鼠下齿缝中的牙齿退化负责。