Seo Young-Soo, Kim Eusung, Kwon Soo Yong, Jing Huaiyu, Shin Kwanwoo
Department of Nano Science & Technology, Sejong University, Seoul 143-737, Republic of Korea.
Ultramicroscopy. 2008 Sep;108(10):1186-90. doi: 10.1016/j.ultramic.2008.04.043. Epub 2008 May 9.
Phase-separation behavior of polystyrene (PS) and poly(methyl methacrylate) (PMMA) 1:1 blend film has been studied as a function of film thickness and component by adding PS-b-PMMA diblock copolymer. After annealing, PS is phase-separated into circular-shaped bumps on a PMMA layer. The bump number is inversely proportional to the film thickness in log-log plot while the slope is invariable for the blends with and without 5% PS-b-PMMA diblock copolymer. The bump size and inter-bump spacing are also affected by both the film thickness and addition of the block copolymer.
通过添加聚苯乙烯-聚甲基丙烯酸甲酯（PS-b-PMMA）二嵌段共聚物，研究了聚苯乙烯（PS）与聚甲基丙烯酸甲酯（PMMA）1:1共混膜的相分离行为与膜厚度和组分的关系。退火后，PS在PMMA层上相分离成圆形凸起。在对数-对数图中，凸起数量与膜厚度成反比，而对于添加和未添加5% PS-b-PMMA二嵌段共聚物的共混物，斜率不变。凸起尺寸和凸起间距也受膜厚度和嵌段共聚物添加量的影响。
